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Molecular approach to semiconductors: a shift towards ecofriendly manufacturing and neuroinspired interfaces

K. Yu. Monakhov, C. Meinecke, M. Moors, C. Schmitz-Antoniak, T. Blaudeck , J. Hann, C. Bickmann, D. Reuter, T. Otto, S. E. Schulz, H. Parala, A. Devi
Pure Appl. Chem., 2024, 96, 9, 1313-1331


Assessing the potential of non-pyrophoric Zn(DMP)2 for the fast deposition of ZnO functional coatings by spatial atomic layer deposition

L. Johnston, J. Obenlüneschloß, M. Farooq Khan Niazi, M. Weber, C. Lausecker, L. Rapenne, H. Roussel, C. Sanchez-Velazquez, D. Bellet, A. Devi, D. Muñoz-Rojas
RSC Appl. Interfaces, 2024, Advanced Article


A sustainable CVD approach for ZrN as a potential catalyst for nitrogen reduction reaction

J.-P. Glauber, J. Lorenz, J. Liu, B. Müller, S. Bragulla, A. Kostka, D. Rogalla, M. Wark, M. Nolan, C. Harms, A. Devi,
Dalton Trans., 2024, Advance Article


Tuning the Permeation Properties of Poly(1-trimethylsilyl-1-propyne) by Vapor Phase Infiltration Using Trimethylaluminum

J. Jenderny, N. Boysen, J. Rubner, F. Zysk, F. Preischel, T. de los Arcos, V. Raj Damerla, A. Kostka, J. Franke, R. Dahlmann, T. D. Kühne, M. Wessling, P. Awakowicz, A. Devi,
Adv. Mater. Interfaces, 2024, 2400171


Atomic and Molecular Layer Deposition of Functional Thin Films Based on Rare Earth Elements

A. Ghazy, D. Zanders, A. Devi, M. Karppinen,
Adv. Mater. Interfaces, 2024, 2400274


Targeting Manganese Amidinates and ß-Ketoiminates Complexes as Precursors for Mn-Based Thin Film Vapor Deposition

M. Wilken, A. Muriqi, A. Krusenbaum, M. Nolan, A. Devi,
Chem. Eur. J., 2024, e202401275


Self-reducing precursors for aluminium metal thin films: evaluation of stable aluminium hydrides for vapor phase aluminium deposition

N. Huster, R. Mullins, M. Nolan, A. Devi,
Dalton Trans., 2024, 53, 7711 – 7720