» Publications 2020

A carbene stabilized precursor for the spatial atomic layer deposition of copper thin films

N. Boysen, B. Misimi, A. Muriqi, J.-L. Wree, T. Hasselmann, D. Rogalla. T. Haeger, D. Theirich, M. T. Riedl, A. Devi
Chem. Commun., 2020, 56, 13752-13755.

A new metalorganic chemical vapor deposition process for MoS2 with a 1,4-diazabutadienyl stabilized molybdenum precursor and elemental sulfur

J.-L. Wree, E. Ciftyurek, D. Zanders, N. Boysen, A. Kostka, D. Rogalla, M. Kasischke, A. Ostendorf, K. Schierbaum, A. Devi
Dalton Trans., 2020, 49, 13462-13474.

Study on structural and thermal characteristics of heteroleptic yttrium complexes as potential precursors for vapor phase deposition

S. M. J. Beer, A. Krusenbaum, M. Winter, C. Vahlas, A. Devi,
Eur. J. Inorg. Chem., 2020, 3587–3596.

Tuning Coordination Geometry of Nickel Ketoiminates and its Influence on Thermal Characteristics for Chemical Vapor Deposition of Nanostructured NiO Electrocatalysts

D. Zywitzki, D. Taffa, L. Lamkowski, M. Winter, D. Rogalla, M. Wark, A. Devi,
Inorg. Chem., 2020, 59, , 14, 10059–10070.

Additive-free spin coating of tin oxide thin films: Synthesis, characterization and evaluation of tin β-ketoiminates as a new precursor class for solution deposition processes

N. Huster, D. Zanders, S. Karle, D. Rogalla, A. Devi,
Dalton Trans., 2020, 49, 10755-10764.

A Rare Low‐Spin Co(IV) Bis(β‐silyldiamide) with High Thermal Stability: Steric Enforcement of a Doublet Configuration

D. Zanders, G. Bačić, D. Leckie, D. O. Odegbesan, J. Rawson, J. D. Masuda, A. Devi, S. T. Barry,
Angew. Chem., Int. Ed., 2020, 59, 33, 14138-14142.

Click here for Chem Rxiv preprint

From Precursor Chemistry to Gas Sensors: Plasma-Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications

L. Mai, F. Mitschker, C. Bock, A. Niesen, E. Ciftyurek, D. Rogalla, J. Mickler, M. Erig, Z. Li, P. Awakowicz, K. Schierbaum, A. Devi,
Small, 2020, 1907506, 1-12.

Comparative Study of Photocarrier Dynamics in CVD-deposited CuWO4, CuO, and WO3 Thin Films for Photoelectrocatalysis

J. Hirst, S. Müller, D. Peeters, A. Sadlo, L. Mai, O. Mendoza Reyes, D. Friedrich, D. Mitoraj, A. Devi, R. Beranek, R. Eichberger, Z. Phys. Chem., 2020, 234(4), 699–717.