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» Publications 2021

Investigation of an atomic-layer-deposited Al2O3 diffusion barrier between Pt and Si for the use in atomic scale atom probe tomography studies on a combinatorial processing platform

Y. Li, D. Zanders, M. Meischein, A. Devi, A. Ludwig
Surf. Interface Anal., 2021, “TBA”


(tBuN)SiMe2NMe2 – A new N,N’-Κ2-monoanionic ligand for atomic layer deposition precursors

M. B. E. Griffiths, D. Zanders, M. A. Land, J. D. Masuda, A. Devi, S. T. Barry
J. Vac. Sci. Technol., A, 2021, 39, 032409.


Atomic layer deposition of dielectric Y2O3 thin films from a homoleptic yttrium formamidinate precursor and water

N. Boysen, D. Zanders, T. Berning, S. M. J. Beer, D. Rogalla, C. Bock, A. Devi, RSC Adv., 2021, 11, 2565-2574.


Fabrication of GdxFeyOz films using an atomic layer deposition-type approach

P. Yu, S. M. J. Beer, A. Devi, M. Coll,
CrystEngComm., 2021, Advance Article.


Development of Guanidinate and Amidinate based Cerium and Ytterbium Complexes as Atomic Layer Deposition Precursors: Synthesis, Modelling, and Application

P. Kaur, L. Mai, A. Muriqi, D. Zanders, R. Ghiyasi, M. Safdar, N. Boysen, M. Winter, M. Nolan, M. Karppinen, A. Devi,
Chem. Eur. J., 2021, 27