Publications 2018

Electrical Performance and Stability of ZnO Thin-Film Transistors Incorporating Gadolinium Oxide High-k Dielectrics

D. K. Ngwashi, S. Paul, A. Devi, R. B. M. Cross,

Advances in Materials, 2018, 7(4), 137-143

Atomic Layer Deposition of Molybdenum and Tungsten Oxide Thin Films Using Heteroleptic Imido-Amidinato precursors: Process Development, Film Characterization, and Gas Sensing Properties

M. Mattinen, J.-L. Wree, N. Stegmann, E. Ciftyurek, M. E. Achhab, P. J. King, K. Mizohata, J. Räisänen, K. D. Schierbaum, A. Devi, M. Ritala, M. Leskelä
Chem. Mater., 2018, 30, 23 , 8690-8701

Atomic/molecular layer deposition of Cu–organic thin films

D. J. Hagen, L. Mai, A. Devi, J. Sainioc, M. Karppinen
Dalton Trans., 2018, 47, 15791-15800

An N‐Heterocyclic Carbene Based Silver Precursor for Plasma‐Enhanced Spatial Atomic Layer Deposition of Silver Thin Films at Atmospheric Pressure

N. Boysen, T. Hasselmann, S. Karle, D. Rogalla, D. Theirich, M. Winter, T. Riedl, A. Devi
Angew. Chem. Int. Ed., 2018, 57, 16224–16227

Synthesis of rare-earth metal and rare-earth metal-fluoride nanoparticles in ionic liquids and propylene carbonate

M. Siebels, L. Mai, L. Schmoltke, K. Schütte, J. Barthel, J. Yue, J. Thomas, B. M. Smarsly, A. Devi, R. A. Fischer, C. Janiak
Beilstein J. Nanotechnol. 2018, 9, 1881-1894

Designing Stability into Thermally Reactive Plumbylenes

Bačić, G., Zanders, D., Mallick, B., Devi, A., Barry, S. T.
Inorg. Chem. 2018, 57, 8218−8226

Direct growth of MoS₂ and WS₂ layers by Metal Organic Chemical Vapor Deposition

S. Cwik, D. Mitoraj, D. Rogalla, D. Peeters, J. Kim, O. Mendoza Reyes, H. M. Schütz, C. Bock, R. Beranek, A. Devi,
Adv. Mater. Interfaces 2018, 5, 1800140

Fabrication of Zinc-Dicarboxylate- and Zinc-Pyrazolate-Carboxylate-Framework Thin Films through Vapour-Solid Deposition

R. Medishetty, Z. Zhang, A. Sadlo, S. Cwik, D. Peeters, S. Henke, N. Mangayarkarasi, A. Devi
Dalton Trans. 2018, 47, 14179-14183

Rational development of cobalt β-ketoiminate complexes: Alternative precursors for vapor phase deposition of spinel cobalt oxide photoelectrodes

K. j. Puring, D. Zywitzki, D. H. Taffa, D. Rogalla, M. Winter, M. Wark, A. Devi,
Inorg. Chem. 2018, 57(9), 5133–5144

Ultrasound-mediated deposition and cytocompatibility of apatite-like coatings on magnesium alloys

C.-N. Lui, F. Böke, M. Gebhard, A. Devi, H. Fischer, A. Keller, G. Grundmeier,
Surf. Coat. Technol. 2018, 345, 167-176

PEALD of SiO₂ and Al₂O₃ thin films on polypropylene: Investigations of the film growth at the interface, stress and gas barrier properties of dyads

M. Gebhard, L. Mai, L. Banko, F. Mitschker, C. Hoppe, M. Jaritz, D. Kirchheim, C. Zekorn, T. de Los Arcos, D. Grochla, R. Dahlmann, G. Grundmeier, P. Awakowicz, A. Ludwig, A. Devi,
ACS Appl. Mater. Interfaces 2018, 10, 7422-7434

CVD-grown copper tungstate thin films for solar water splitting

D. Peeters, O. Mendoza Reyes, L. Mai, A. Sadlo, S. Cwik, D. Rogalla, H. Schütz, H.-W. Becker, J. Hirst, S. Müller, D. Friedrich, D. Mitoraj, M. Nagli, M. Caspary Toroker, R. Eichberger, R. Beranek, A. Devi,
J. Mater. Chem. A 2018, 6, 10206 – 10216

Tailored β-ketoiminato complexes of iron: Synthesis, characterisation and evaluation towards solution based deposition of iron oxide thin films

A. Sadlo, S. M. J. Beer, S. Rahman, M. Grafen, D. Rogalla, M. Winter, A. Ostendorf, A. Devi,
Eur. J. Inorg. Chem. 2018, 1824-1833,

A Combinatorial Approach to Enhance Barrier Properties of Thin Films on Polymers: Seeding and Capping of PECVD Thin Films by PEALD

M. Gebhard, F. Mitschker, C. Hoppe, M. Aghaee, D. Rogalla, M. Creatore, G. Grundmeier, P. Awakowicz, a. Devi,
Plasma Processes Polym. 2018, 15, e1700209

Water assisted atomic layer deposition of yttrium oxide using tris(N,N’-diisopropyl-2-dimethylamido-guanidinato) yttrium(III): Process development, film characterization and functional properties

L. Mai, N. Boysen, E. Subaşı, T. de los Arcos, D. Rogalla, G. Grundmeier, C. Bock, H.-L. Lu, A. Devi,
RSC Adv. 2018, 8, 4987-4994

Molecular engineering of Ga-ketoiminates: Synthesis, structure and evaluation as precursors for the additive-free spin-coated deposition of gallium oxide thin films

R. O’Donoghue, S. Rahman, B. Mallick, M. Winter, D. Rogalla, H. -W. Becker, A. Devi,
New. J. Chem. 2018, 42, 3196-3210

Inorganic Materials Chemistry