Group Devi

Welcome to the homepage of the research group “Inorganic Materials Chemistry” IMC of Prof. Dr. Anjana Devi. Our group focuses on the development, synthesis and evaluation of high-performance precursors for vapor phase deposition processes namely chemical vapor deposition (CVD), atomic layer deposition (ALD) and molecular layer deposition (MLD).
We collaborate with scientists from various disciplines (Physics, Chemistry and Engineers) and our goal is to develop nanostructured materials for different applications ranging from microelectronics, sensors, dielectrics, barrier coatings, spintronics, optics, catalysis etc.

NEWS:

New publication

30. April 2021

Investigation of an atomic-layer-deposited Al₂O₃ diffusion barrier between Pt and Si for the use in atomic scale atom probe tomography studies on a combinatorial processing platform

Y. Li, D. Zanders, M. Meischein, A. Devi, A. Ludwig
Surf. Interface Anal., 2021, “TBA”
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New publication

22. March 2021

(^tBuN)SiMe₂NMe₂ – A new N,N’-Κ₂-monoanionic ligand for atomic layer deposition precursors

M. B. E. Griffiths, D. Zanders, M. A. Land, J. D. Masuda, A. Devi, S. T. Barry
J. Vac. Sci. Technol., A, 2021, 39, 032409.
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25. February 2021

New master student on board

We welcome Marcel Schmickler joining our IMC team as a new Master student.
He will be working on synthesis and characterization of lanthanide precursors.
We wish him a productive research stay!

25. January 2021

Congratulations to Anjana

The Royal Society of Chemistry (RSC) journal “Dalton Transactions” has nominated Anjana to the Editorial Advisory Board effective from January 2021 in recognition of her contributions towards the research areas of Inorganic and Materials Chemistry.
A further motivation for all of us!
The IMC team wishes her more success in her future research career!

7. January 2021

Santa brought a present for Anjana

Thanks to my “Kindergarten” for the beautiful Christmas gift.
You guys are my motivation to carry on doing high-quality research!
Keep up the spirit!

6. January 2021

New Cover page

Check out our new cover feature in Chem. Eur. J. designed by our PhD student Parmish Kaur which demonstrates a water assisted ALD process of CeO₂ thin films. The background picture was taken by herself during a flight. The paper is a successful outcome of the EU-ITN-HYCOAT project collaborating with Tyndall National institute (Ireland), Aalto University (Finland) and RUB. Check out the full story on rationally developed precursor chemistry for cerium, DFT modelling and ALD of CeO₂ by clicking on the picture below.

21. December 2020

Merry Christmas and a Happy New Year!

What a year! So far, our group was lucky dodging the Corona virus and everybody is healthy which is most important.
Despite the challenging situation in terms of organizing and mastering lab work and home office, we had a successful year 2020.
We especially would like to thank all our cooperation partners for the fruitful collaborations supporting our fundamental research on precursor development and thin film fabrication.

Merry Christmas and a Happy New Year 2021!
Stay healthy!

New publication

Atomic layer deposition of dielectric Y₂O₃ thin films from a homoleptic yttrium formamidinate precursor and water

N. Boysen, D. Zanders, T. Berning, S. M. J. Beer, D. Rogalla, C. Bock, A. Devi, RSC Adv., 2021, 11, 2565-2574.
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New publication

7. December 2020

Fabrication of Gd_xFe_yO_z films using an atomic layer deposition-type approach

P. Yu, S. M. J. Beer, A. Devi, M. Coll,
CrystEngComm., 2021, Advance Article.
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New publication

8. October 2020

A carbene stabilized precursor for the spatial atomic layer deposition of copper thin films

N. Boysen, B. Misimi, A. Muriqi, J.-L. Wree, T. Hasselmann, D. Rogalla. T. Haeger, D. Theirich, M. T. Riedl, A. Devi
Chem. Commun., 2020, 56, 13752-13755.
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