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Welcome!


Group photo 2018
Welcome to the homepage of the research group “Inorganic Materials ChemistryIMC of Prof. Dr. Anjana Devi. Our group focuses on the development, synthesis and evaluation of high-performance precursors for vapor phase deposition processes namely chemical vapor deposition (CVD), atomic layer deposition (ALD) and molecular layer deposition (MLD).
We collaborate with scientists from various disciplines (Physics, Chemistry and Engineers) and our goal is to develop nanostructured materials for different applications ranging from microelectronics, sensors, dielectrics, barrier coatings, spintronics, optics, catalysis etc.

NEWS:

New publication
18. March 2019

Potential Precursor Alternatives to the Pyrophoric Trimethyl Aluminum for the Atomic Layer Deposition of Aluminum Oxide

L. Mai, N. Boysen, D. Zanders, T. de los Arcos, F. Mitschker, B. Mallick, G.Grundmeier, P. Awakowicz, A. Devi
Chem. – Eur. J., 2019, Accepted manuscript, DOI: 10.1002/chem.201900475
Read the full article...
7. March 2019

New cover page

Our group member Sebastian Beer designed an inside cover page for Dalton Transactions visualizing the idea behind our article on rare-earth sulfide MOCVD. For the full article, please click on the image.

Cover_Datlon_Transactions_Nd2S3
28. February 2019

Rob Ameloot visiting our group

Today, Rob Ameloot visited our group to give a fascinating talk about “Metal-organic framework chemical vapor deposition (MOF-CVD)”. He is the leader of the Ameloot Group at the KU Leuven, Belgium.
With his research, Mr. Ameloot builds a bridge between the unique properties of MOFs and their application in microelectronics through the development of new chemical vapor deposition techniques.
After his talk, we had a fruitful discussion about CVD techniques, thin film growth mechanisms and precursor chemistry and how we can benefit from each other to increase the scientific outcome.

Link to homepage: Ameloot Group
11. February 2019

New cluster tool for 2D-materials and devices funded by the BMBF

A consortium consisting of research groups at RUB that includes engineers (Plasma and Microsystems) and chemists (Inorganic Materials Chemistry) have been granted a new project “ForLab PICT2DES” funded by the Bundesministerium für Bildung und Forschung (BMBF). This is one among the 12 ForLabs in Germany that have been granted by the BMBF.
Projektteam The project team from RUB: Anjana Devi, Peter Awakovicz, Julian Schulze, Claudia Bock und Martin Hoffmann (from left to right).

The granted 4 million euros by the BMBF is to acquire a unique cluster tool that integrates ALD, ALE, PECVD, RIE and in-situ plasma diagnostics. This state-of-the-art tool will be employed for the deposition of 2D-materials, etching, passivation and subsequently device structures will be fabricated that will play an important role in the future for various applications in the field of microelectronics, optoelectronics, sensors, energy etc.
The interdisciplinary research activities starting from precursors chemistry to materials development followed by process diagnostics and device fabrication will be the key to realize the goals of various projects that will be carried using the “ForLab- PICT2DES” cluster tool at RUB.
For more information:
Press report from RUB (only available in german language)
Website of the ForLab PICT2DES project
3. February 2019

A new research project on corrosion protection coatings funded by the BMBF

Development of innovative corrosion protection coatings (CBC) for injection molds via CVD/PECVD/ALD will be the theme of the new project funded by the BMBF. The consortium includes researchers from Germany and also from France. This joint consortium is a part of the internationalization strategy of the BMBF. The IMC research group will focus on developing new precursors and processes for corrosion protection coatings.
More information will follow soon.
18. January 2019

New research project on 2D-Materials funded by the DFG within the DFG-SPP program (FFlexCom-SPP-1796)

A new research project FlexMoS2 which will focus on the fabrication of 2D-Materials such as MoS2 has been granted by the German Research Foundation (DFG) within the priority research program FflexCom (DFG-SPP-1796). The joint project entitled ‘Flexible high-speed thin-film transistors and circuits based on large-area grown two-dimensional transition metal dichalcogenides (TMDs)” will be carried out by our research group (IMC) together with Dr. Claudia Bock (Dept. of Microsystems, RUB).
The main research objectives of the project are the growth and integration of 2D-materials such as TMDs for flexible electronics. The IMC group will develop new ALD and CVD processes for 2D materials/TMDs using novel precursor chemistry combinations. Together with the engineering department, the group will investigate the electrical and topographical properties of the TMDs layers/high-k oxides for device fabrication and integration of 2D-materials into functional devices.

For more information:
FlexMoS2: Flexible high-speed thin-film transistors and circuits based on large-area grown two-dimensional transition metal dichalcogenides
SPP 1796 FFLexCom: High Frequency Flexible Bendable Electronics for Wireless Communication Systems
New publication
10. January 2019

Low-Temperature Plasma-Enhanced Atomic Layer Deposition of Tin(IV) Oxide from a Functionalized Alkyl Precursor: Fabrication and Evaluation of SnO2-Based Thin-Film Transistor Devices

L. Mai, D. Zanders, E. Subaşı, E. Ciftyurek, C. Hoppe, D. Rogalla, W. Gilbert, T. de los Arcos, K. Schierbaum, G. Grundmeier, C. Bock, A. Devi,
ACS Appl. Mater. Interfaces, 2019, 11, 3, 3169-3180
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New publication
14. December 2018

Luminescent Nd2S3 thin films: A new chemical vapour deposition route towards rare-earth sulphides

S. Cwik, S. M. J. Beer, M. Schmidt, N. C. Gerhardt, T. de los Arcos, D. Rogalla, J. Weßling, I. Giner, M. R. Hofmann, G. Grundmeier, A. D. Wieck, A. Devi
Dalton Trans., 2019, 48, 2926 – 2938
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New publication
13. December 2018

Electrical Performance and Stability of ZnO Thin-Film Transistors Incorporating Gadolinium Oxide High-k Dielectrics

D. K. Ngwashi, S. Paul, A. Devi, R. B. M. Cross,

Advances in Materials, 2018, 7(4), 137-143
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New publication
13. November 2018

Atomic Layer Deposition of Molybdenum and Tungsten Oxide Thin Films Using Heteroleptic Imido-Amidinato precursors: Process Development, Film Characterization, and Gas Sensing Properties

M. Mattinen, J.-L. Wree, N. Stegmann, E. Ciftyurek, M. E. Achhab, P. J. King, K. Mizohata, J. Räisänen, K. D. Schierbaum, A. Devi, M. Ritala, M. Leskelä
Chem. Mater., 2018, 30, 23 , 8690-8701
Read the full article...