Group Devi

Welcome to the homepage of the research group “Inorganic Materials Chemistry” IMC of Prof. Dr. Anjana Devi. Our group focuses on the development, synthesis and evaluation of high-performance precursors for vapor phase deposition processes namely chemical vapor deposition (CVD), atomic layer deposition (ALD) and molecular layer deposition (MLD).
We collaborate with scientists from various disciplines (Physics, Chemistry and Engineers) and our goal is to develop nanostructured materials for different applications ranging from microelectronics, sensors, dielectrics, barrier coatings, spintronics, optics, catalysis etc.

NEWS:

24. June 2019

EuroCVD 22-Baltic ALD 16

This week, our group will participate in the EuroCVD 22-Baltic ALD 16 international conference in Luxembourg. We will contribute 5 talks and 3 posters covering our research fields. So be prepared for new precursor chemistry and process design for ALD and CVD applications!

23. May 2019

New bachelor student

We welcome our new bachelor student Florian Preischel who will perform his bachelor thesis in our research group within the summer term. He will focus on the development of Al and Hf precursors suitable for chemical vapor deposition techniques.

New publication

Up-converting ALD/MLD thin films with Yb³⁺, Er³⁺ in amorphous organic framework

M. Tuomisto, Z. Giedraityte, L. Mai, A. Devi, V. Boiko, K. Grzeszkiewicz, D. Hreniak, M. Karppinen, M. Lastusaari
J. Lumin., 2019, 215, 310-315
Read the full article...

2. May 2019

New cover page

Our group member Lukas Mai recently published his results on potential precursor alternatives for trimethylaluminium (TMA) together with a cover page in Chemistry – A European Journal. If you are interested in th full article, please click on the cover.

New publication

12. April 2019

How Water Flips at Charged Titanium Dioxide: An SFG-Study on the Water-TiO₂-Interface

S. J. Schlegel, S. Hosseinpour, M. Gebhard, A. Devi, M. Bonn, E. H.G. Backus,
Phys. Chem. Chem. Phys., 2019, 21, 8956-8964
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4. April 2019

Twitter bot launched

We created a Twitter bot which surveys RSS feeds from scientific journals looking for publications related to CVD, ALD MLD etc.
Stay updated and check it out!

Follow @CVD_ALD_papers

New publication

18. March 2019

Potential Precursor Alternatives to the Pyrophoric Trimethyl Aluminum for the Atomic Layer Deposition of Aluminum Oxide

L. Mai, N. Boysen, D. Zanders, T. de los Arcos, F. Mitschker, B. Mallick, G.Grundmeier, P. Awakowicz, A. Devi
Chem. – Eur. J., 2019, 25, 7489 –7500
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7. March 2019

New cover page

Our group member Sebastian Beer designed an inside cover page for Dalton Transactions visualizing the idea behind our article on rare-earth sulfide MOCVD. For the full article, please click on the image.

New publication

10. January 2019

Low-Temperature Plasma-Enhanced Atomic Layer Deposition of Tin(IV) Oxide from a Functionalized Alkyl Precursor: Fabrication and Evaluation of SnO₂-Based Thin-Film Transistor Devices

L. Mai, D. Zanders, E. Subaşı, E. Ciftyurek, C. Hoppe, D. Rogalla, W. Gilbert, T. de los Arcos, K. Schierbaum, G. Grundmeier, C. Bock, A. Devi,
ACS Appl. Mater. Interfaces, 2019, 11, 3, 3169-3180
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New publication

14. December 2018

Luminescent Nd₂S₃ thin films: A new chemical vapour deposition route towards rare-earth sulphides

S. Cwik, S. M. J. Beer, M. Schmidt, N. C. Gerhardt, T. de los Arcos, D. Rogalla, J. Weßling, I. Giner, M. R. Hofmann, G. Grundmeier, A. D. Wieck, A. Devi
Dalton Trans., 2019, 48, 2926 – 2938
Read the full article...