Group photo 2021
Welcome to the homepage of the research group “Inorganic Materials Chemistry” (IMC).

We are always on the lookout for enthusiastic people to join the research group and to fill the available positions within the framework of national, international, and industry projects.

Available Positions:

– Bachelor thesis
– Master (in-depth and research practical, thesis)
– PhD
– Post-doc

Contact: imc-administration@rub.de


8. May 2023

New Publication in Small

Just in time for the arrival of Spring, a highly productive collaboration with Prof. Julien Bachmann’s group from Friedrich Alexander University Erlangen has blossomed and results in hot off the press publication in Wiley’s Small Journal. Together, we explored a smart precursor solution for highly controllable Additive Layer Atomic Manufacturing (ALAM) of ZnO thin lines with tunable properties. With its thermal stability and controllable reactivity our carthorse precursor Zn(DMP)2 saved the day yet again. In a thorough comparative deposition and materials characterization study led by the Erlangen team, the precursor’s superior performance over the commercial standard DEZ was illustrated. The cornerstone for innovative precursor chemistry application in the emerging ALAM technique is placed and more is yet to follow.
For the time being, you can read about the exciting findings on ZnO ALAM here.
New publication

Direct-Patterning ZnO Deposition by Atomic-Layer Additive Manufacturing Using a Safe and Economical Precursor

S. Stefanovic, N. Gheshlaghi, D. Zanders, I. Kundrata, B. Zhao, M. K. S. Barr, M. Halik, A. Devi, J. Bachmann
Small, 2023, 2301774
Read the full article...

New publication in ACS Materials Au

TOC ACS Mater. Au

In a collaborative effort with researchers from Air Liquide (Japan) and the IMC team in Bochum, LMGP Grenoble (France) led by Matthieu Weber, a new feature article on pathways to lower the environmental impact of ALD was just published in ACS Materials Au.
As the global warming is making its impact, new ways to mitigate greenhouse gas emissions and overall pollution of the environment need to be explored. The semiconductor industry is certainly contributing to the emissions and atomic layer deposition (ALD) is gaining significant importance in this area. From our perspective, we highlight different ways to mitigate the environmentally relevant emissions by ALD from three different perspectives. First, we discuss the overall emissions of ALD tools and processes from conventional to spatial ALD processes and potential way how to reduce those emissions. As a second integral part of the ALD processes, the potential pathways on how to reduce the emissions of precursor chemistry based on the principles of green chemistry are discussed. Lastly, an industrial perspective on ALD processes and emissions mitigation is presented to round up our article.
The different ways to mitigate emissions should motivate the ALD community to dedicate more effort and research in the areas of green chemistry and mitigation of emissions.
New publication

Assessing the Environmental Impact of Atomic Layer Deposition (ALD) Processes and Pathways to Lower It

M. Weber, N. Boysen, O. Graniel, A. Sekkat, C. Dussarrat, P. Wiff, A. Devi, and D. Muñoz-Rojas
ACS Mater. Au, 2023, Accepted Manuscript
Read the full article...
5. May 2023


ALD for Industry

In late March, the annually organized „ALD4Industry“ conference taking place in Dresden had entered the next round. Be it during the presentation or poster sessions or informally behind the scenes, the “who is who” of the European Semiconductor Industry and Academia was getting together to discuss the latest market trends. Besides, many participants from overseas made it to the event. The Devi Lab was represented by David, who delivered an invited tutorial on the various shades of precursor chemistry specifically for metallic thin films. He surely did not spare the audience a springing charge of chemistry! Yet, everyone seemed happy and there were lots of positive interactions afterwards. So, great job, David!

IMC REACTIVE team goes to France

project meeting Orleans

Three IMC PhD students, Martin, Marcel and Jorit had the opportunity to visit fellow scientists and collaboration partners at the Gremi in Orleans who hosted the half-yearly project meeting. The DFG-ANR funded binational REACTIVE project focuses on new plasma assisted spatial ALD processes for solar cell applications. The host team showed the latest developments for a new plasma source. All the partners contributed their latest work such as precursor chemistry from our IMC group to spatial ALD performed by the Grenoble team, and solar-cell application studies in Strasbourg. After this great exchange and a very interesting lab tour through facilities otherwise quite remote to us chemists, the event was concluded by a nice French lunch. After a little tour of the city, the IMC team headed back through Paris with a head full of new ideas.
New publication
23. March 2023

Plasma-Enhanced Atomic Layer Deposition of Molybdenum Oxide Thin Films at Low Temperatures for Hydrogen Gas Sensing

J.-L. Wree, D. Rogalla, A. Ostendorf, K. D. Schierbaum, A. Devi
ACS Appl. Mater. Interfaces, 2023, 15, 11, 14502–14512
Read the full article...
22. December 2022

Happy Holidays and a good start into 2023

Christmas Card 2022

Happy holidays and merry christmas to those who celebrate from the whole IMC Team. It has been a productive and successful year with over 20 publications, many conferences and recently two excellent PhD defenses. A big thank you to all of our friends, colleagues and collaborators.
Stay healthy and see you all in 2023!
New publication
21. December 2022

Size and shape exclusion in 2D silicon dioxide membranes

P. Dementyev, N. Khayya, D. Zanders, I. Ennen, A. Devi, E. Altman,
Small, 2022, 2205602
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New publication

Liquid injection field desorption/ionization as a powerful tool to characterize volatile, labile, and reactive metal–organic complexes

N. Boysen, A. Devi
Eur. J. Mass Spectrometry, 2022, Accepted Manuscript
Read the full article...