Group Devi

Welcome to the homepage of the research group “Inorganic Materials Chemistry” IMC of Prof. Dr. Anjana Devi. Our group focuses on the development, synthesis and evaluation of high-performance precursors for vapor phase deposition processes namely chemical vapor deposition (CVD), atomic layer deposition (ALD) and molecular layer deposition (MLD).
We collaborate with scientists from various disciplines (Physics, Chemistry and Engineers) and our goal is to develop nanostructured materials for different applications ranging from microelectronics, sensors, dielectrics, barrier coatings, spintronics, optics, catalysis etc.

NEWS:

2. July 2020

New chemistry for ultra-thin gas sensors

Our group member Lukas Mai recently published his work on PEALD ZnO thin films for gas sensing applications in the renowned Journal Small. Now, his studies are highlighted and summarized in a press release article of our university!

Click here to be redirected to the English version of the article.
Für die deutsche RUB Pressemitteilung hier klicken.

15. June 2020

Nickel oxide thin films for oxygen evolution reaction

Congratulations! Dennis’ recent research work on Ni β-ketoiminates is published in Inorganic Chemistry.
Apart from developing a new class of Ni precursors, NiO thin films were grown via CVD and its assessment in electrocatalysis revealed promising activity for oxygen evolution reactions (OER).
Another fruitful collaboration with Dr. Dereje Taffa and Prof. Michael Wark from the University of Oldenburg.
If you are interested in the article, click here.

New publication

10. June 2020

Tuning Coordination Geometry of Nickel Ketoiminates and its Influence on Thermal Characteristics for Chemical Vapor Deposition of Nanostructured NiO Electrocatalysts

D. Zywitzki, D. Taffa, L. Lamkowski, M. Winter, D. Rogalla, M. Wark, A. Devi,
Inorg. Chem., 2020, accepted manuscript. DOI: /10.1021/acs.inorgchem.0c01204
Read the full article...

9. June 2020

Cover page in Small

Our Master student Florian is not only working in the lab – He designed the cover page for the journal Small! Check out the creative and fancy artwork that he created illustrating the sensing behavior of Zinc Oxide layers fabricated via PEALD using a non-pyrophoric zinc precursor. For more details click on the cover which will redirect you to the published article from Lukas.

An unusual cobalt compound

Interested in Co precursor chemistry?
David developed a novel, rather unusual Co complex with a spin configuration of 1/2 which could be of interest for future battery technology.
These exciting news were recently highlighted in a RUB press release! The articles are available in both German and English language:
RUB press release
RUB Pressemitteilung

New publication

8. June 2020

Additive-free spin coating of tin oxide thin films: Synthesis, characterization and evaluation of tin β-ketoiminates as a new precursor class for solution deposition processes

N. Huster, D. Zanders, S. Karle, D. Rogalla, A. Devi,
Dalton Trans., 2020, accepted manuscript, DOI: 10.1039/D0DT01463J.
Read the full article...

28. May 2020

Finnische Universität zeichnet Anjana Devi aus

Unsere Arbeitsgruppenleiterin Anjana Devi wurde kürzlich mit der Ehrendoktorwürde der Aalto Universität aus Finnland ausgezeichnet.
Ausschlaggebend für die Ehrung ist ihre führende Position im Bereich der Präkursoren- und Dünnschichtentwicklung sowie ihr jahrelanges Engagement im Bereich der Vernetzung der ALD und CVD Gemeinschaft.
Deine Arbeitsgruppe ist stolz auf deine Leistung und wir dürfen dich nun Prof. Dr. Dr. Devi nennen!

Link zur offiziellen RUB Pressemitteilung

New publication

25. May 2020

A Rare Low‐Spin Co(IV) Bis(β‐silyldiamide) with High Thermal Stability: Steric Enforcement of a Doublet Configuration

D. Zanders, G. Bačić, D. Leckie, D. O. Odegbesan, J. Rawson, J. D. Masuda, A. Devi, S. T. Barry, Angew. Chem., Int. Ed., 2020, accepted manuscript,
DOI: /10.1002/anie.202001518.

Click here for Chem Rxiv preprint
Read the full article...

New publication

29. April 2020

From Precursor Chemistry to Gas Sensors: Plasma-Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications

L. Mai, F. Mitschker, C. Bock, A. Niesen, E. Ciftyurek, D. Rogalla, J. Mickler, M. Erig, Z. Li, P. Awakowicz, K. Schierbaum, A. Devi,
Small, 2020, 1907506, 1-12.
Read the full article...

New publication

27. November 2019

Comparative Study of Photocarrier Dynamics in CVD-deposited CuWO₄, CuO, and WO₃ Thin Films for Photoelectrocatalysis

J. Hirst, S. Müller, D. Peeters, A. Sadlo, L. Mai, O. Mendoza Reyes, D. Friedrich, D. Mitoraj, A. Devi, R. Beranek, R. Eichberger, Z. Phys. Chem., 2020, 234(4), 699–717.
Read the full article...