» Publications 2019

PEALD of HfO2 Thin Films: Precursor Tuning and a New Near Ambient Pressure XPS Approach to in-situ Examination of Thin Film Surfaces Exposed to Reactive Gases

D. Zanders, E. Ciftyurek, E. Subaşı, N. Huster, C. Bock, A. Kostka, D. Rogalla, K. Schierbaum and A. Devi
ACS Appl. Mater. Interfaces, 2019, 11, 31, 28407-28422.

Up-converting ALD/MLD thin films with Yb3+, Er3+ in amorphous organic framework

M. Tuomisto, Z. Giedraityte, L. Mai, A. Devi, V. Boiko, K. Grzeszkiewicz, D. Hreniak, M. Karppinen, M. Lastusaari
J. Lumin., 2019, 215, 310-315

How Water Flips at Charged Titanium Dioxide: An SFG-Study on the Water-TiO2-Interface

S. J. Schlegel, S. Hosseinpour, M. Gebhard, A. Devi, M. Bonn, E. H.G. Backus,
Phys. Chem. Chem. Phys., 2019, 21, 8956-8964

Potential Precursor Alternatives to the Pyrophoric Trimethyl Aluminum for the Atomic Layer Deposition of Aluminum Oxide

L. Mai, N. Boysen, D. Zanders, T. de los Arcos, F. Mitschker, B. Mallick, G.Grundmeier, P. Awakowicz, A. Devi
Chem. – Eur. J., 2019, 25, 7489 –7500

Low-Temperature Plasma-Enhanced Atomic Layer Deposition of Tin(IV) Oxide from a Functionalized Alkyl Precursor: Fabrication and Evaluation of SnO2-Based Thin-Film Transistor Devices

L. Mai, D. Zanders, E. Subaşı, E. Ciftyurek, C. Hoppe, D. Rogalla, W. Gilbert, T. de los Arcos, K. Schierbaum, G. Grundmeier, C. Bock, A. Devi,
ACS Appl. Mater. Interfaces, 2019, 11, 3, 3169-3180

Luminescent Nd2S3 thin films: A new chemical vapour deposition route towards rare-earth sulphides

S. Cwik, S. M. J. Beer, M. Schmidt, N. C. Gerhardt, T. de los Arcos, D. Rogalla, J. Weßling, I. Giner, M. R. Hofmann, G. Grundmeier, A. D. Wieck, A. Devi
Dalton Trans., 2019, 48, 2926 – 2938

Validation of a terminally amino functionalized tetra alkyl Sn(IV) precursor in metalorganic chemical vapor deposition of SnO2 thin films: Study of film growth characteristics, optical and electrical properties

D. Zanders, E. Ciftyurek, C. Hoppe, A. Kostka, D. Rogalla, T. de los Arcos, G. Grundmeier, K. D. Schierbaum, A. Devi
Adv. Mater. Interfaces, 2019, 6, 1801540

Investigating Zinc Ketoiminates as a New Class of Precursors for Solution Deposition of ZnO Thin Films

A. Sadlo, D. Peeters, R. Albert, D. Rogalla, H.-W. Becker, R. Schmechel, A. Devi,
J. Nanosci. Nanotechnol. 2019, 19, 867-876, DOI: 10.1166/jnn.2018.15739