» Publications
Pure Appl. Chem., 2024, 96, 9, 1313-1331
RSC Appl. Interfaces, 2024, Advanced Article
Dalton Trans., 2024, Advance Article
Adv. Mater. Interfaces, 2024, 2400171
Adv. Mater. Interfaces, 2024, 2400274
Chem. Eur. J., 2024, e202401275
Dalton Trans., 2024, 53, 7711 – 7720
Angew. Chem. Int. Ed., 2023, e202312123
Chemistry, 2023, 5, 2038
Adv. Eng. Mater., 2023, 25, 2300677
J. Mater. Chem. A, 2023, 11 (40), 21595
Plasma Process Polym., 2023, e 2300150
Plasma Process Polym., 2023, e 2300186
Surf. Sci. Spectra, 2023, 30, 024021
Surf. Interface Anal., 2023, 55, 886
Adv. Mater. Interfaces, 2023, 2300244
Plasma Processes Polym., 2023, e2300050
Small, 2023, 2301774
ACS Mater. Au, 2023, 3, 4, 274-298.
ACS Appl. Mater. Interfaces, 2023, 15, 11, 14502–14512
Small, 2022, 2205602
Eur. J. Mass Spectrometry, 2022, Accepted Manuscript
Small, 2022, 18, 2204828
J. Colloid Interface Sci., 2022, 622,156
Small, 2022, 2204636
ACS Appl. Mater. Interfaces, 2022, 14, 46, 52149–52162
Mater. Res. Express, 2022, 9, 116401
Adv. Mater. Interfaces, 2022, 2201709
Adv. Mater. Technol., 2022, 2200796
Z. anorg. allg. Chem., 2022, e202200249
Dalton Trans., 2022, 51, 14970-14979
Dalton Trans., 2022, 51, 14508-14516
ACS Appl. Electron. Mater., 2022, 4, 8, 3772-3779
Dalton Trans., 2022, 51, 5603-5611
Micro Nano Eng., 2022, 15, 100126
Nano Lett., 2022, 22, 3, 1287–1293
ACS Appl. Mater. Interfaces, 2022, 14, 10, 12845–12854
Chem. Eur. J., 2022, 28, e202103798
Plasma Process. Polym., 2021, Accepted Manuscript
Dalton Trans., 2022, 51, 1384–1394.
Chem. Mater., 2022, 34, 1, 152–164.
Eur. J. Inorg. Chem., 2021, Accepted Manuscript
Dalton Trans., 2021, 50, 14832-14841
Adv. Mater. Interfaces, 2021, 8, 2100949
Dalton Trans., 2021, 50, 12944 – 12956
J. Mater. Chem. C, 2021, 9, 10254 – 10265
Adv. Eng. Mater., 2021, 23, 2100446
Chem. Mater, 2021, 33, 13, 5045-5057
J. Mater. Res. Technol., 2021, 13, 1599-1614.
Surf. Interface Anal., 2021, 1-7
J. Vac. Sci. Technol., A, 2021, 39, 032409.
CrystEngComm., 2021,23, 730-740.
Chem. Commun., 2020, 56, 13752-13755.
Chem. Eur. J., 2021, 27
Dalton Trans., 2020, 49, 13462-13474.
Eur. J. Inorg. Chem., 2020, 3587–3596.
Inorg. Chem., 2020, 59, , 14, 10059–10070.
Dalton Trans., 2020, 49, 10755-10764.
Angew. Chem., Int. Ed., 2020, 59, 33, 14138-14142.
Click here for Chem Rxiv preprint
Small, 2020, 1907506, 1-12.
ACS Appl. Mater. Interfaces, 2019, 11, 31, 28407-28422.
J. Lumin., 2019, 215, 310-315
Phys. Chem. Chem. Phys., 2019, 21, 8956-8964
Chem. – Eur. J., 2019, 25, 7489 –7500
ACS Appl. Mater. Interfaces, 2019, 11, 3, 3169-3180
Dalton Trans., 2019, 48, 2926 – 2938
Advances in Materials, 2018, 7(4), 137-143
Chem. Mater., 2018, 30, 23 , 8690-8701
Adv. Mater. Interfaces, 2019, 6, 1801540
Dalton Trans., 2018, 47, 15791-15800
Angew. Chem. Int. Ed., 2018, 57, 16224–16227
Beilstein J. Nanotechnol. 2018, 9, 1881-1894
Inorg. Chem. 2018, 57, 8218−8226
Adv. Mater. Interfaces 2018, 5, 1800140
Dalton Trans. 2018, 47, 14179-14183
Inorg. Chem. 2018, 57(9), 5133–5144
Surf. Coat. Technol. 2018, 345, 167-176
ACS Appl. Mater. Interfaces 2018, 10, 7422-7434
J. Mater. Chem. A 2018, 6, 10206 – 10216
J. Nanosci. Nanotechnol. 2019, 19, 867-876, DOI: 10.1166/jnn.2018.15739
Eur. J. Inorg. Chem. 2018, 1824-1833,
Plasma Processes Polym. 2018, 15, e1700209
RSC Adv. 2018, 8, 4987-4994
New. J. Chem. 2018, 42, 3196-3210
J. Phys. Chem. C 2018, 122, 1367
Phys. Chem. Chem. Phys. 2018, 20, 180-190
ACS Appl. Mater. Interfaces 2018, 10, 468-476
Molecular approach to semiconductors: a shift towards ecofriendly manufacturing and neuroinspired interfaces
K. Yu. Monakhov, C. Meinecke, M. Moors, C. Schmitz-Antoniak, T. Blaudeck , J. Hann, C. Bickmann, D. Reuter, T. Otto, S. E. Schulz, H. Parala, A. DeviPure Appl. Chem., 2024, 96, 9, 1313-1331
Assessing the potential of non-pyrophoric Zn(DMP)2 for the fast deposition of ZnO functional coatings by spatial atomic layer deposition
L. Johnston, J. Obenlüneschloß, M. Farooq Khan Niazi, M. Weber, C. Lausecker, L. Rapenne, H. Roussel, C. Sanchez-Velazquez, D. Bellet, A. Devi, D. Muñoz-RojasRSC Appl. Interfaces, 2024, Advanced Article
A sustainable CVD approach for ZrN as a potential catalyst for nitrogen reduction reaction
J.-P. Glauber, J. Lorenz, J. Liu, B. Müller, S. Bragulla, A. Kostka, D. Rogalla, M. Wark, M. Nolan, C. Harms, A. Devi,Dalton Trans., 2024, Advance Article
Tuning the Permeation Properties of Poly(1-trimethylsilyl-1-propyne) by Vapor Phase Infiltration Using Trimethylaluminum
J. Jenderny, N. Boysen, J. Rubner, F. Zysk, F. Preischel, T. de los Arcos, V. Raj Damerla, A. Kostka, J. Franke, R. Dahlmann, T. D. Kühne, M. Wessling, P. Awakowicz, A. Devi,Adv. Mater. Interfaces, 2024, 2400171
Atomic and Molecular Layer Deposition of Functional Thin Films Based on Rare Earth Elements
A. Ghazy, D. Zanders, A. Devi, M. Karppinen,Adv. Mater. Interfaces, 2024, 2400274
Targeting Manganese Amidinates and ß-Ketoiminates Complexes as Precursors for Mn-Based Thin Film Vapor Deposition
M. Wilken, A. Muriqi, A. Krusenbaum, M. Nolan, A. Devi,Chem. Eur. J., 2024, e202401275
Self-reducing precursors for aluminium metal thin films: evaluation of stable aluminium hydrides for vapor phase aluminium deposition
N. Huster, R. Mullins, M. Nolan, A. Devi,Dalton Trans., 2024, 53, 7711 – 7720
Ultrafast surface-specific spectroscopy of water at a photoexcited TiO2 model water-splitting photocatalyst
E. H. G. Backus, S. Hosseinpour, C. Ramanan, S. Sun, S. J. Schlegel, M. Zelenka, X. Jia, M. Gebhard, A. Devi, H. I. Wang, M. BonnAngew. Chem. Int. Ed., 2023, e202312123
In pursuit of next generation N-heterocyclic carbene-stabilized copper and silver precursors for metalorganic chemical vapor deposition and atomic layer deposition processes
I. Selvakumar, N. Boysen, M. Bürger, A. DeviChemistry, 2023, 5, 2038
Ultrashort pulse laser annealing of amorphous atomic layer deposited MoS2 films
M. J. M. J. Becher, J. Jagosz, R.-M. Neubieser, J.-L. Wree, A. Devi, M. Michel, C. Bock, E, L. Gurevich, A. OstendorfAdv. Eng. Mater., 2023, 25, 2300677
Advances in photo-assisted seawater splitting promoted by green iron oxide-carbon nitride photoelectrocatalysts
M. Benedet, G. A Rizzi, O. I Lebedev, V. Roddatis, C. Sada, J.-L Wree, A. Devi, C. Maccato, A. Gasparotto, D. BarrecaJ. Mater. Chem. A, 2023, 11 (40), 21595
PECVD and PEALD on polymer substrates (Part I): Fundamentals and analysis of plasma activation and thin film growth
T. de los Arcos, P. Awakowicz, J. Benedikt, B. Biskup, M. Böke, N. Boysen, R. Buschhaus, R. Dahlmann, A. Devi, T. Gergs, J. Jenderny, A. von Keudell, T. D. Kühne, S. Kusmierz, H. Müller, T. Mussenbrock, J. Trieschmann, D. Zanders, F. Zysk, G. GrundmeierPlasma Process Polym., 2023, e 2300150
PECVD and PEALD on polymer substrates (Part II): Understanding and tuning of barrier and membrane properties of thin films
T. de los Arcos, P. Awakowicz, M. Böke, N. Boysen, R. P. Brinkmann, R. Dahlmann, A. Devi, D. Eremin, J. Franke, T. Gergs, J. Jenderny, E. Kemaneci, T. D. Kühne, S. Kusmierz, T. Mussenbrock, J. Rubner, J. Trieschmann, M. Wessling, X. Xie, D. Zanders, F. Zysk, G. GrundmeierPlasma Process Polym., 2023, e 2300186
Fe2O3-graphitic carbon nitride nanocomposites analyzed by XPS
M. Benedet, D. Barreca, G. A. Rizzi, C. Maccato, J-L. Wree, A. Devi, A. GasparottoSurf. Sci. Spectra, 2023, 30, 024021
Complementary spectroscopic and electrochemical analysis of the sealing of micropores in hexamethyldisilazane plasma polymer films by Al2O3 atomic layer deposition
X. Xie, D. Zanders, F. Preischel, T. de los Arcos, A. Devi, and G. GrundmeierSurf. Interface Anal., 2023, 55, 886
Interplay of Precursor and Plasma for The Deposition of HfO2 via PEALD: Film Growth and Dielectric Properties
Preischel, F.; Zanders, D.; Berning, T.; Kostka, A.; Rogalla, D.; Bock, C.; Devi, A.Adv. Mater. Interfaces, 2023, 2300244
The impact of plasma enhancement on the deposition of carbon containing zirconia films by metalorganic chemical vapor deposition
Maaß, P. A.; Bedarev, V.; Chauvet, L.; Prenzel, M.; Glauber, J.-P.; Devi, A.; Böke, M.; von Keudell, A.Plasma Processes Polym., 2023, e2300050
Direct-Patterning ZnO Deposition by Atomic-Layer Additive Manufacturing Using a Safe and Economical Precursor
S. Stefanovic, N. Gheshlaghi, D. Zanders, I. Kundrata, B. Zhao, M. K. S. Barr, M. Halik, A. Devi, J. BachmannSmall, 2023, 2301774
Assessing the Environmental Impact of Atomic Layer Deposition (ALD) Processes and Pathways to Lower It
M. Weber, N. Boysen, O. Graniel, A. Sekkat, C. Dussarrat, P. Wiff, A. Devi, and D. Muñoz-RojasACS Mater. Au, 2023, 3, 4, 274-298.
Plasma-Enhanced Atomic Layer Deposition of Molybdenum Oxide Thin Films at Low Temperatures for Hydrogen Gas Sensing
J.-L. Wree, D. Rogalla, A. Ostendorf, K. D. Schierbaum, A. DeviACS Appl. Mater. Interfaces, 2023, 15, 11, 14502–14512
Size and shape exclusion in 2D silicon dioxide membranes
P. Dementyev, N. Khayya, D. Zanders, I. Ennen, A. Devi, E. Altman,Small, 2022, 2205602
Liquid injection field desorption/ionization as a powerful tool to characterize volatile, labile, and reactive metal–organic complexes
N. Boysen, A. DeviEur. J. Mass Spectrometry, 2022, Accepted Manuscript
Heterostructured α‐Fe2O3@ZnO@ZIF‐8 Core–Shell Nanowires for a Highly Selective MEMS‐Based ppb‐Level H2S Gas Sensor System
L.‐Y. Zhu, X.‐Y. Miao, L.‐X. Ou, L.‐W. Mao, K. Yuan, S. Sun, A. Devi, H.‐L. LuSmall, 2022, 18, 2204828
Highly sensitive and stable MEMS acetone sensors based on well-designed α-Fe2O3/C mesoporous nanorods
L.-Y. Zhu, K. Yuan, Z.-C. Li, X.-Y. Miao, J.-C. Wang, S. Sun, A. Devi, H.-L. LuJ. Colloid Interface Sci., 2022, 622,156
CVD grown tungsten oxide for low temperature hydrogen gas sensors: Tuning surface characteristics via materials processing for sensing applications
M. Wilken, E. Ciftyürek, S. Cwik, L. Mai, B. Mallick, D. Rogalla, K. D. Schierbaum, A. DeviSmall, 2022, 2204636
High-Performance Iridium Thin Films for Water Splitting by CVD Using New Ir(I) Precursors
N. Boysen, J.-L. Wree, D. Zanders, D. Rogalla, D. Öhl, W. Schuhmann, A. DeviACS Appl. Mater. Interfaces, 2022, 14, 46, 52149–52162
Nucleation and growth studies of large-area deposited WS2 on flexible substrates
T. Berning, M. Becher, J.-L. Wree, J. Jagosz, A. Kostka, A. Ostendorf, A. Devi, C. BockMater. Res. Express, 2022, 9, 116401
Unveiling Ruthenium(II) Diazadienyls for Gas Phase Deposition Processes: Low Resistivity Ru Thin Films and Their Performance in the Acidic Oxygen Evolution Reaction
D. Zanders, J. Obenlüneschloß, J.-L. Wree, J. Jagosz, P. Kaur, N. Boysen, D. Rogalla, A. Kostka, C. Bock, D. Öhl, M. Gock, W. Schuhmann, A. DeviAdv. Mater. Interfaces, 2022, 2201709
Silver Thin-Film Electrodes Grown by Low-Temperature Plasma-Enhanced Spatial Atomic Layer Deposition at Atmospheric Pressure
T. Hasselmann, B. Misimi, N. Boysen, D. Zanders, J.-L. Wree, D. Rogalla, T. Haeger, F. Zimmermann, K. O. Brinkmann, S. Schädler, D. Theirich, R. Heiderhoff, A. Devi, T. RiedlAdv. Mater. Technol., 2022, 2200796
An Unusual Tri-coordinate Co(II) Silylamide with Potential for Chemical Vapor Deposition Processes
D. Zanders, J. D. Masuda, B. Lowe, S. Curtis, A. Devi, S. T. BarryZ. anorg. allg. Chem., 2022, e202200249
SnO via Water Based ALD employing Tin(II) Formamidinate: Precursor Characterization and Process Development
N. Huster, R. Ghiyasi, D. Zanders, D. Rogalla, M. Karppinen, A. DeviDalton Trans., 2022, 51, 14970-14979
Low-temperature ALD/MLD growth of alucone and zincone thin films from non-pyrophoric precursors
A. Philip, L. Mai, R. Ghiyasi, A. Devi, M. KarppinenDalton Trans., 2022, 51, 14508-14516
Ferromagnetic Cobalt Disulfide: A CVD Pathway Toward High-Quality and Phase-Pure Thin Films
J.-L. Wree, J.-P. Glauber, D. Zanders, D. Rogalla, M. Becher, M. B. E. Griffiths, A. Ostendort, S. T. Barry, A. Ney, A. DeviACS Appl. Electron. Mater., 2022, 4, 8, 3772-3779
Atomic / Molecular Layer Deposition of Cerium (III) Hybrid Thin Films using Rigid Organic Precursors
P. Kaur, A. Muriqi, J.-L. Wree, R. Ghiyasi, M. Safdar, M. Nolan, M. Karppinen, A. DeviDalton Trans., 2022, 51, 5603-5611
Low-temperature ALD process development of 200 mm wafer-scale MoS2 for gas sensing application
R.-M. Neubieser, J.-L. Wree, J. Jagosz, M. Becher, A. Ostendorf, A. Devi, C. Bock, M. Michel, A. GrabmaierMicro Nano Eng., 2022, 15, 100126
Molecular Permeation in Freestanding Bilayer Silica
Daniil Naberezhnyi, L. Mai, N. Doudin, I. Ennen, A. Hütten, E. I. Altman, A. Devi, P. DementyevNano Lett., 2022, 22, 3, 1287–1293
Bendable Polycrystalline and Magnetic CoFe2O4 Membranes by Chemical Methods
P. Salles, R. Guzmán, D. Zanders, A. Quintana, I. Fina, F. Sánchez, W. Zhou, A. Devi, M. CollACS Appl. Mater. Interfaces, 2022, 14, 10, 12845–12854
Role of anionic backbone in NHC-stabilized coinage metal complexes: New precursors for atomic layer deposition
N. Boysen, A. Philip, D. Rogalla, M. Karppinen, A. DeviChem. Eur. J., 2022, 28, e202103798
Influence of surface activation on the microporosity of PE-CVD and PE-ALD SiOx thin films on PDMS
C. Hoppe, F. Mitschker, L. Mai, M. O. Liedke, T. de los Arcos, P. Awakowicz, A. Devi, A. Attallah, M. Butterling, A. Wagner, G. GrundmeierPlasma Process. Polym., 2021, Accepted Manuscript
Influence of Different Ester Side Groups in Polymers on the Vapor Phase Infiltration with Trimethyl Aluminum
L. Mai, D. Maniar, F. Zysk, J. Schöbel, T. Kühne, K. Loos, A. DeviDalton Trans., 2022, 51, 1384–1394.
Ferromagnetic europium sulfide thin films: Influence of precursors on magneto-optical properties
S. M. J. Beer, M. Arbersha, P. Lindner, M. Winter, D. Rogalla, M. Nolan, A. Ney, J. Debus, A. DeviChem. Mater., 2022, 34, 1, 152–164.
Co(II) Amide, Pyrrolate, and Aminopyridinate Complexes: Assessment of their Manifold Structural Chemistry and Thermal Properties
D. Zanders, N. Boysen, M. A. Land, J. Obenlüneschloß, J. D. Masuda, B. Mallick, S. T. Barry, A. DeviEur. J. Inorg. Chem., 2021, Accepted Manuscript
CVD grown GaSbxN1-x films as visible-light active photoanodes
D. Zywitzki, D. Mitoraj, Y. Vilk, O. Mendoza Reyes, M. Schleuning, D. Friedrich, A. Sadlo, D. Rogalla, R. Eichberger, R. Beranek, A. DeviDalton Trans., 2021, 50, 14832-14841
Chemical vapor deposition of Cobalt and Nickel Ferrite thin films: Investigation of structure and pseudocapacitive properties
D. Zywitzki, R. Schaper, E. Ciftyürek, J.-L. Wree, D. H. Taffa, D. M. Baier, D. Rogalla, Y. Li, M. Meischein, A. Ludwig, Z. Li, K. Schierbaum, M. Wark, A. DeviAdv. Mater. Interfaces, 2021, 8, 2100949
A study on the influence of ligand variation on formamidinate complexes of yttrium: New precursors for atomic layer deposition of yttrium oxide
S. M. J. Beer, N. Boysen, A. Muriqi, D. Zanders, T. Berning, D. Rogalla, C. Bock, M. Nolan, A. DeviDalton Trans., 2021, 50, 12944 – 12956
Sensing and electrocatalytic activity of tungsten disulphide thin films fabricated via metalorganic chemical vapour deposition
J.‑L. Wree, J.‑P. Glauber, D. Öhl, A. Niesen, A. Kostka, D. Rogalla, W. Schuhmann, A. DeviJ. Mater. Chem. C, 2021, 9, 10254 – 10265
Atomic Layer Deposition of High-Quality Copper Metal Films from Cu(acac)2 and Hydroquinone Reductant
T. S. Tripathi, M. Wilken, C. Hoppe, T. de los Arcos, G. Grundmeier, A. Devi, M. KarppinenAdv. Eng. Mater., 2021, 23, 2100446
Cobalt Metal ALD: Understanding the Mechanism and Role of Zinc Alkyl Precursors as Reductants for Low Resistivity Co Thin Films
D. Zanders, J. Liu, J. Obenlüneschloß, C. Bock, D. Rogalla, L. Mai, M. Nolan, S. T. Barry, A.DeviChem. Mater, 2021, 33, 13, 5045-5057
Direct liquid injection chemical vapor deposition of ZrO2 films from a heteroleptic Zr precursor: Interplay between film characteristics and corrosion protection of stainless steel
S. M. J. Beer, D. Samelor, A. Abdel Aal, J. Etzkorn, D. Rogalla, A. E. Turgambaeva, J. Esvan, A. Kostka, C. Vahlas, A. DeviJ. Mater. Res. Technol., 2021, 13, 1599-1614.
Investigation of an atomic-layer-deposited Al2O3 diffusion barrier between Pt and Si for the use in atomic scale atom probe tomography studies on a combinatorial processing platform
Y. Li, D. Zanders, M. Meischein, A. Devi, A. LudwigSurf. Interface Anal., 2021, 1-7
(tBuN)SiMe2NMe2 – A new N,N’-Κ2-monoanionic ligand for atomic layer deposition precursors
M. B. E. Griffiths, D. Zanders, M. A. Land, J. D. Masuda, A. Devi, S. T. BarryJ. Vac. Sci. Technol., A, 2021, 39, 032409.
Atomic layer deposition of dielectric Y2O3 thin films from a homoleptic yttrium formamidinate precursor and water
N. Boysen, D. Zanders, T. Berning, S. M. J. Beer, D. Rogalla, C. Bock, A. Devi, RSC Adv., 2021, 11, 2565-2574.Fabrication of GdxFeyOz films using an atomic layer deposition-type approach
P. Yu, S. M. J. Beer, A. Devi, M. Coll,CrystEngComm., 2021,23, 730-740.
A carbene stabilized precursor for the spatial atomic layer deposition of copper thin films
N. Boysen, B. Misimi, A. Muriqi, J.-L. Wree, T. Hasselmann, D. Rogalla. T. Haeger, D. Theirich, M. T. Riedl, A. DeviChem. Commun., 2020, 56, 13752-13755.
Development of Guanidinate and Amidinate based Cerium and Ytterbium Complexes as Atomic Layer Deposition Precursors: Synthesis, Modelling, and Application
P. Kaur, L. Mai, A. Muriqi, D. Zanders, R. Ghiyasi, M. Safdar, N. Boysen, M. Winter, M. Nolan, M. Karppinen, A. Devi,Chem. Eur. J., 2021, 27
A new metalorganic chemical vapor deposition process for MoS2 with a 1,4-diazabutadienyl stabilized molybdenum precursor and elemental sulfur
J.-L. Wree, E. Ciftyurek, D. Zanders, N. Boysen, A. Kostka, D. Rogalla, M. Kasischke, A. Ostendorf, K. Schierbaum, A. DeviDalton Trans., 2020, 49, 13462-13474.
Study on structural and thermal characteristics of heteroleptic yttrium complexes as potential precursors for vapor phase deposition
S. M. J. Beer, A. Krusenbaum, M. Winter, C. Vahlas, A. Devi,Eur. J. Inorg. Chem., 2020, 3587–3596.
Tuning Coordination Geometry of Nickel Ketoiminates and its Influence on Thermal Characteristics for Chemical Vapor Deposition of Nanostructured NiO Electrocatalysts
D. Zywitzki, D. Taffa, L. Lamkowski, M. Winter, D. Rogalla, M. Wark, A. Devi,Inorg. Chem., 2020, 59, , 14, 10059–10070.
Additive-free spin coating of tin oxide thin films: Synthesis, characterization and evaluation of tin β-ketoiminates as a new precursor class for solution deposition processes
N. Huster, D. Zanders, S. Karle, D. Rogalla, A. Devi,Dalton Trans., 2020, 49, 10755-10764.
A Rare Low‐Spin Co(IV) Bis(β‐silyldiamide) with High Thermal Stability: Steric Enforcement of a Doublet Configuration
D. Zanders, G. Bačić, D. Leckie, D. O. Odegbesan, J. Rawson, J. D. Masuda, A. Devi, S. T. Barry,Angew. Chem., Int. Ed., 2020, 59, 33, 14138-14142.
Click here for Chem Rxiv preprint
From Precursor Chemistry to Gas Sensors: Plasma-Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications
L. Mai, F. Mitschker, C. Bock, A. Niesen, E. Ciftyurek, D. Rogalla, J. Mickler, M. Erig, Z. Li, P. Awakowicz, K. Schierbaum, A. Devi,Small, 2020, 1907506, 1-12.
Comparative Study of Photocarrier Dynamics in CVD-deposited CuWO4, CuO, and WO3 Thin Films for Photoelectrocatalysis
J. Hirst, S. Müller, D. Peeters, A. Sadlo, L. Mai, O. Mendoza Reyes, D. Friedrich, D. Mitoraj, A. Devi, R. Beranek, R. Eichberger, Z. Phys. Chem., 2020, 234(4), 699–717.PEALD of HfO2 Thin Films: Precursor Tuning and a New Near Ambient Pressure XPS Approach to in-situ Examination of Thin Film Surfaces Exposed to Reactive Gases
D. Zanders, E. Ciftyurek, E. Subaşı, N. Huster, C. Bock, A. Kostka, D. Rogalla, K. Schierbaum and A. DeviACS Appl. Mater. Interfaces, 2019, 11, 31, 28407-28422.
Up-converting ALD/MLD thin films with Yb3+, Er3+ in amorphous organic framework
M. Tuomisto, Z. Giedraityte, L. Mai, A. Devi, V. Boiko, K. Grzeszkiewicz, D. Hreniak, M. Karppinen, M. LastusaariJ. Lumin., 2019, 215, 310-315
How Water Flips at Charged Titanium Dioxide: An SFG-Study on the Water-TiO2-Interface
S. J. Schlegel, S. Hosseinpour, M. Gebhard, A. Devi, M. Bonn, E. H.G. Backus,Phys. Chem. Chem. Phys., 2019, 21, 8956-8964
Potential Precursor Alternatives to the Pyrophoric Trimethyl Aluminum for the Atomic Layer Deposition of Aluminum Oxide
L. Mai, N. Boysen, D. Zanders, T. de los Arcos, F. Mitschker, B. Mallick, G.Grundmeier, P. Awakowicz, A. DeviChem. – Eur. J., 2019, 25, 7489 –7500
Low-Temperature Plasma-Enhanced Atomic Layer Deposition of Tin(IV) Oxide from a Functionalized Alkyl Precursor: Fabrication and Evaluation of SnO2-Based Thin-Film Transistor Devices
L. Mai, D. Zanders, E. Subaşı, E. Ciftyurek, C. Hoppe, D. Rogalla, W. Gilbert, T. de los Arcos, K. Schierbaum, G. Grundmeier, C. Bock, A. Devi,ACS Appl. Mater. Interfaces, 2019, 11, 3, 3169-3180
Luminescent Nd2S3 thin films: A new chemical vapour deposition route towards rare-earth sulphides
S. Cwik, S. M. J. Beer, M. Schmidt, N. C. Gerhardt, T. de los Arcos, D. Rogalla, J. Weßling, I. Giner, M. R. Hofmann, G. Grundmeier, A. D. Wieck, A. DeviDalton Trans., 2019, 48, 2926 – 2938
Electrical Performance and Stability of ZnO Thin-Film Transistors Incorporating Gadolinium Oxide High-k Dielectrics
D. K. Ngwashi, S. Paul, A. Devi, R. B. M. Cross,Advances in Materials, 2018, 7(4), 137-143
Atomic Layer Deposition of Molybdenum and Tungsten Oxide Thin Films Using Heteroleptic Imido-Amidinato precursors: Process Development, Film Characterization, and Gas Sensing Properties
M. Mattinen, J.-L. Wree, N. Stegmann, E. Ciftyurek, M. E. Achhab, P. J. King, K. Mizohata, J. Räisänen, K. D. Schierbaum, A. Devi, M. Ritala, M. LeskeläChem. Mater., 2018, 30, 23 , 8690-8701
Validation of a terminally amino functionalized tetra alkyl Sn(IV) precursor in metalorganic chemical vapor deposition of SnO2 thin films: Study of film growth characteristics, optical and electrical properties
D. Zanders, E. Ciftyurek, C. Hoppe, A. Kostka, D. Rogalla, T. de los Arcos, G. Grundmeier, K. D. Schierbaum, A. DeviAdv. Mater. Interfaces, 2019, 6, 1801540
Atomic/molecular layer deposition of Cu–organic thin films
D. J. Hagen, L. Mai, A. Devi, J. Sainioc, M. KarppinenDalton Trans., 2018, 47, 15791-15800
An N‐Heterocyclic Carbene Based Silver Precursor for Plasma‐Enhanced Spatial Atomic Layer Deposition of Silver Thin Films at Atmospheric Pressure
N. Boysen, T. Hasselmann, S. Karle, D. Rogalla, D. Theirich, M. Winter, T. Riedl, A. DeviAngew. Chem. Int. Ed., 2018, 57, 16224–16227
Synthesis of rare-earth metal and rare-earth metal-fluoride nanoparticles in ionic liquids and propylene carbonate
M. Siebels, L. Mai, L. Schmoltke, K. Schütte, J. Barthel, J. Yue, J. Thomas, B. M. Smarsly, A. Devi, R. A. Fischer, C. JaniakBeilstein J. Nanotechnol. 2018, 9, 1881-1894
Designing Stability into Thermally Reactive Plumbylenes
Bačić, G., Zanders, D., Mallick, B., Devi, A., Barry, S. T.Inorg. Chem. 2018, 57, 8218−8226
Direct growth of MoS2 and WS2 layers by Metal Organic Chemical Vapor Deposition
S. Cwik, D. Mitoraj, D. Rogalla, D. Peeters, J. Kim, O. Mendoza Reyes, H. M. Schütz, C. Bock, R. Beranek, A. Devi,Adv. Mater. Interfaces 2018, 5, 1800140
Fabrication of Zinc-Dicarboxylate- and Zinc-Pyrazolate-Carboxylate-Framework Thin Films through Vapour-Solid Deposition
R. Medishetty, Z. Zhang, A. Sadlo, S. Cwik, D. Peeters, S. Henke, N. Mangayarkarasi, A. DeviDalton Trans. 2018, 47, 14179-14183
Rational development of cobalt β-ketoiminate complexes: Alternative precursors for vapor phase deposition of spinel cobalt oxide photoelectrodes
K. j. Puring, D. Zywitzki, D. H. Taffa, D. Rogalla, M. Winter, M. Wark, A. Devi,Inorg. Chem. 2018, 57(9), 5133–5144
Ultrasound-mediated deposition and cytocompatibility of apatite-like coatings on magnesium alloys
C.-N. Lui, F. Böke, M. Gebhard, A. Devi, H. Fischer, A. Keller, G. Grundmeier,Surf. Coat. Technol. 2018, 345, 167-176
PEALD of SiO2 and Al2O3 thin films on polypropylene: Investigations of the film growth at the interface, stress and gas barrier properties of dyads
M. Gebhard, L. Mai, L. Banko, F. Mitschker, C. Hoppe, M. Jaritz, D. Kirchheim, C. Zekorn, T. de Los Arcos, D. Grochla, R. Dahlmann, G. Grundmeier, P. Awakowicz, A. Ludwig, A. Devi,ACS Appl. Mater. Interfaces 2018, 10, 7422-7434
CVD-grown copper tungstate thin films for solar water splitting
D. Peeters, O. Mendoza Reyes, L. Mai, A. Sadlo, S. Cwik, D. Rogalla, H. Schütz, H.-W. Becker, J. Hirst, S. Müller, D. Friedrich, D. Mitoraj, M. Nagli, M. Caspary Toroker, R. Eichberger, R. Beranek, A. Devi,J. Mater. Chem. A 2018, 6, 10206 – 10216
Investigating Zinc Ketoiminates as a New Class of Precursors for Solution Deposition of ZnO Thin Films
A. Sadlo, D. Peeters, R. Albert, D. Rogalla, H.-W. Becker, R. Schmechel, A. Devi,J. Nanosci. Nanotechnol. 2019, 19, 867-876, DOI: 10.1166/jnn.2018.15739
Tailored β-ketoiminato complexes of iron: Synthesis, characterisation and evaluation towards solution based deposition of iron oxide thin films
A. Sadlo, S. M. J. Beer, S. Rahman, M. Grafen, D. Rogalla, M. Winter, A. Ostendorf, A. Devi,Eur. J. Inorg. Chem. 2018, 1824-1833,
A Combinatorial Approach to Enhance Barrier Properties of Thin Films on Polymers: Seeding and Capping of PECVD Thin Films by PEALD
M. Gebhard, F. Mitschker, C. Hoppe, M. Aghaee, D. Rogalla, M. Creatore, G. Grundmeier, P. Awakowicz, a. Devi,Plasma Processes Polym. 2018, 15, e1700209
Water assisted atomic layer deposition of yttrium oxide using tris(N,N’-diisopropyl-2-dimethylamido-guanidinato) yttrium(III): Process development, film characterization and functional properties
L. Mai, N. Boysen, E. Subaşı, T. de los Arcos, D. Rogalla, G. Grundmeier, C. Bock, H.-L. Lu, A. Devi,RSC Adv. 2018, 8, 4987-4994
Molecular engineering of Ga-ketoiminates: Synthesis, structure and evaluation as precursors for the additive-free spin-coated deposition of gallium oxide thin films
R. O’Donoghue, S. Rahman, B. Mallick, M. Winter, D. Rogalla, H. -W. Becker, A. Devi,New. J. Chem. 2018, 42, 3196-3210
Manganese(II) Molecular Sources for Plasma-Assisted CVD of Mn Oxides and Fluorides: From Precursors to Growth Process
D. Barreca, G. Carraro, E. Fois, A. Gasparotto, F. Gri, R. Seraglia, M. Wilken, A. Venzo, A. Devi, G. Tabacchi, C. Maccato,J. Phys. Chem. C 2018, 122, 1367
Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
M. Wiesing, T. de los Arcos, M. Gebhard, A. Devi, G. Grundmeier,Phys. Chem. Chem. Phys. 2018, 20, 180-190
Atomic Layer Deposition of Nickel on ZnO Nanowire Arrays for High-Performance Supercapacitors
Q.-H. Ren, Y. Zhang, H.-L. Lu, Y.-P. Wang, W.-J. Liu, X.-M. Ji, A. Devi, A.-Q. Jiang, D. W. Zhang,ACS Appl. Mater. Interfaces 2018, 10, 468-476