Publications

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Self-reducing precursors for aluminium metal thin films: evaluation of stable aluminium hydrides for vapor phase aluminium deposition

N. Huster, R. Mullins, M. Nolan, A. Devi,
Dalton Trans., 2024, Advance Article

Ultrafast surface-specific spectroscopy of water at a photoexcited TiO₂ model water-splitting photocatalyst

E. H. G. Backus, S. Hosseinpour, C. Ramanan, S. Sun, S. J. Schlegel, M. Zelenka, X. Jia, M. Gebhard, A. Devi, H. I. Wang, M. Bonn
Angew. Chem. Int. Ed., 2023, e202312123

In pursuit of next generation N-heterocyclic carbene-stabilized copper and silver precursors for metalorganic chemical vapor deposition and atomic layer deposition processes

I. Selvakumar, N. Boysen, M. Bürger, A. Devi
Chemistry, 2023, 5, 2038

Ultrashort pulse laser annealing of amorphous atomic layer deposited MoS₂ films

M. J. M. J. Becher, J. Jagosz, R.-M. Neubieser, J.-L. Wree, A. Devi, M. Michel, C. Bock, E, L. Gurevich, A. Ostendorf
Adv. Eng. Mater., 2023, 25, 2300677

Advances in photo-assisted seawater splitting promoted by green iron oxide-carbon nitride photoelectrocatalysts

M. Benedet, G. A Rizzi, O. I Lebedev, V. Roddatis, C. Sada, J.-L Wree, A. Devi, C. Maccato, A. Gasparotto, D. Barreca
J. Mater. Chem. A, 2023, 11 (40), 21595

PECVD and PEALD on polymer substrates (Part I): Fundamentals and analysis of plasma activation and thin film growth

T. de los Arcos, P. Awakowicz, J. Benedikt, B. Biskup, M. Böke, N. Boysen, R. Buschhaus, R. Dahlmann, A. Devi, T. Gergs, J. Jenderny, A. von Keudell, T. D. Kühne, S. Kusmierz, H. Müller, T. Mussenbrock, J. Trieschmann, D. Zanders, F. Zysk, G. Grundmeier
Plasma Process Polym., 2023, e 2300150

PECVD and PEALD on polymer substrates (Part II): Understanding and tuning of barrier and membrane properties of thin films

T. de los Arcos, P. Awakowicz, M. Böke, N. Boysen, R. P. Brinkmann, R. Dahlmann, A. Devi, D. Eremin, J. Franke, T. Gergs, J. Jenderny, E. Kemaneci, T. D. Kühne, S. Kusmierz, T. Mussenbrock, J. Rubner, J. Trieschmann, M. Wessling, X. Xie, D. Zanders, F. Zysk, G. Grundmeier
Plasma Process Polym., 2023, e 2300186

Fe₂O₃-graphitic carbon nitride nanocomposites analyzed by XPS

M. Benedet, D. Barreca, G. A. Rizzi, C. Maccato, J-L. Wree, A. Devi, A. Gasparotto
Surf. Sci. Spectra, 2023, 30, 024021

Complementary spectroscopic and electrochemical analysis of the sealing of micropores in hexamethyldisilazane plasma polymer films by Al₂O₃ atomic layer deposition

X. Xie, D. Zanders, F. Preischel, T. de los Arcos, A. Devi, and G. Grundmeier
Surf. Interface Anal., 2023, 55, 886

Interplay of Precursor and Plasma for The Deposition of HfO₂ via PEALD: Film Growth and Dielectric Properties

Preischel, F.; Zanders, D.; Berning, T.; Kostka, A.; Rogalla, D.; Bock, C.; Devi, A.
Adv. Mater. Interfaces, 2023, 2300244

The impact of plasma enhancement on the deposition of carbon containing zirconia films by metalorganic chemical vapor deposition

Maaß, P. A.; Bedarev, V.; Chauvet, L.; Prenzel, M.; Glauber, J.-P.; Devi, A.; Böke, M.; von Keudell, A.
Plasma Processes Polym., 2023, e2300050

Direct-Patterning ZnO Deposition by Atomic-Layer Additive Manufacturing Using a Safe and Economical Precursor

S. Stefanovic, N. Gheshlaghi, D. Zanders, I. Kundrata, B. Zhao, M. K. S. Barr, M. Halik, A. Devi, J. Bachmann
Small, 2023, 2301774

Assessing the Environmental Impact of Atomic Layer Deposition (ALD) Processes and Pathways to Lower It

M. Weber, N. Boysen, O. Graniel, A. Sekkat, C. Dussarrat, P. Wiff, A. Devi, and D. Muñoz-Rojas
ACS Mater. Au, 2023, 3, 4, 274-298.

Plasma-Enhanced Atomic Layer Deposition of Molybdenum Oxide Thin Films at Low Temperatures for Hydrogen Gas Sensing

J.-L. Wree, D. Rogalla, A. Ostendorf, K. D. Schierbaum, A. Devi
ACS Appl. Mater. Interfaces, 2023, 15, 11, 14502–14512

Size and shape exclusion in 2D silicon dioxide membranes

P. Dementyev, N. Khayya, D. Zanders, I. Ennen, A. Devi, E. Altman,
Small, 2022, 2205602

Liquid injection field desorption/ionization as a powerful tool to characterize volatile, labile, and reactive metal–organic complexes

N. Boysen, A. Devi
Eur. J. Mass Spectrometry, 2022, Accepted Manuscript

Heterostructured α‐Fe₂O₃@ZnO@ZIF‐8 Core–Shell Nanowires for a Highly Selective MEMS‐Based ppb‐Level H₂S Gas Sensor System

L.‐Y. Zhu, X.‐Y. Miao, L.‐X. Ou, L.‐W. Mao, K. Yuan, S. Sun, A. Devi, H.‐L. Lu
Small, 2022, 18, 2204828

Highly sensitive and stable MEMS acetone sensors based on well-designed α-Fe₂O₃/C mesoporous nanorods

L.-Y. Zhu, K. Yuan, Z.-C. Li, X.-Y. Miao, J.-C. Wang, S. Sun, A. Devi, H.-L. Lu
J. Colloid Interface Sci., 2022, 622,156

CVD grown tungsten oxide for low temperature hydrogen gas sensors: Tuning surface characteristics via materials processing for sensing applications

M. Wilken, E. Ciftyürek, S. Cwik, L. Mai, B. Mallick, D. Rogalla, K. D. Schierbaum, A. Devi
Small, 2022, 2204636

High-Performance Iridium Thin Films for Water Splitting by CVD Using New Ir(I) Precursors

N. Boysen, J.-L. Wree, D. Zanders, D. Rogalla, D. Öhl, W. Schuhmann, A. Devi
ACS Appl. Mater. Interfaces, 2022, 14, 46, 52149–52162

Nucleation and growth studies of large-area deposited WS2 on flexible substrates

T. Berning, M. Becher, J.-L. Wree, J. Jagosz, A. Kostka, A. Ostendorf, A. Devi, C. Bock
Mater. Res. Express, 2022, 9, 116401

Unveiling Ruthenium(II) Diazadienyls for Gas Phase Deposition Processes: Low Resistivity Ru Thin Films and Their Performance in the Acidic Oxygen Evolution Reaction

D. Zanders, J. Obenlüneschloß, J.-L. Wree, J. Jagosz, P. Kaur, N. Boysen, D. Rogalla, A. Kostka, C. Bock, D. Öhl, M. Gock, W. Schuhmann, A. Devi
Adv. Mater. Interfaces, 2022, 2201709

Silver Thin-Film Electrodes Grown by Low-Temperature Plasma-Enhanced Spatial Atomic Layer Deposition at Atmospheric Pressure

T. Hasselmann, B. Misimi, N. Boysen, D. Zanders, J.-L. Wree, D. Rogalla, T. Haeger, F. Zimmermann, K. O. Brinkmann, S. Schädler, D. Theirich, R. Heiderhoff, A. Devi, T. Riedl
Adv. Mater. Technol., 2022, 2200796

An Unusual Tri-coordinate Co(II) Silylamide with Potential for Chemical Vapor Deposition Processes

D. Zanders, J. D. Masuda, B. Lowe, S. Curtis, A. Devi, S. T. Barry
Z. anorg. allg. Chem., 2022, e202200249

SnO via Water Based ALD employing Tin(II) Formamidinate: Precursor Characterization and Process Development

N. Huster, R. Ghiyasi, D. Zanders, D. Rogalla, M. Karppinen, A. Devi
Dalton Trans., 2022, 51, 14970-14979

Low-temperature ALD/MLD growth of alucone and zincone thin films from non-pyrophoric precursors

A. Philip, L. Mai, R. Ghiyasi, A. Devi, M. Karppinen
Dalton Trans., 2022, 51, 14508-14516

Ferromagnetic Cobalt Disulfide: A CVD Pathway Toward High-Quality and Phase-Pure Thin Films

J.-L. Wree, J.-P. Glauber, D. Zanders, D. Rogalla, M. Becher, M. B. E. Griffiths, A. Ostendort, S. T. Barry, A. Ney, A. Devi
ACS Appl. Electron. Mater., 2022, 4, 8, 3772-3779

Atomic / Molecular Layer Deposition of Cerium (III) Hybrid Thin Films using Rigid Organic Precursors

P. Kaur, A. Muriqi, J.-L. Wree, R. Ghiyasi, M. Safdar, M. Nolan, M. Karppinen, A. Devi
Dalton Trans., 2022, 51, 5603-5611

Low-temperature ALD process development of 200 mm wafer-scale MoS₂ for gas sensing application

R.-M. Neubieser, J.-L. Wree, J. Jagosz, M. Becher, A. Ostendorf, A. Devi, C. Bock, M. Michel, A. Grabmaier
Micro Nano Eng., 2022, 15, 100126

Molecular Permeation in Freestanding Bilayer Silica

Daniil Naberezhnyi, L. Mai, N. Doudin, I. Ennen, A. Hütten, E. I. Altman, A. Devi, P. Dementyev
Nano Lett., 2022, 22, 3, 1287–1293

Bendable Polycrystalline and Magnetic CoFe₂O₄ Membranes by Chemical Methods

P. Salles, R. Guzmán, D. Zanders, A. Quintana, I. Fina, F. Sánchez, W. Zhou, A. Devi, M. Coll
ACS Appl. Mater. Interfaces, 2022, 14, 10, 12845–12854

Role of anionic backbone in NHC-stabilized coinage metal complexes: New precursors for atomic layer deposition

N. Boysen, A. Philip, D. Rogalla, M. Karppinen, A. Devi
Chem. Eur. J., 2022, 28, e202103798

Influence of surface activation on the microporosity of PE-CVD and PE-ALD SiOx thin films on PDMS

C. Hoppe, F. Mitschker, L. Mai, M. O. Liedke, T. de los Arcos, P. Awakowicz, A. Devi, A. Attallah, M. Butterling, A. Wagner, G. Grundmeier
Plasma Process. Polym., 2021, Accepted Manuscript

Influence of Different Ester Side Groups in Polymers on the Vapor Phase Infiltration with Trimethyl Aluminum

L. Mai, D. Maniar, F. Zysk, J. Schöbel, T. Kühne, K. Loos, A. Devi
Dalton Trans., 2022, 51, 1384–1394.

Ferromagnetic europium sulfide thin films: Influence of precursors on magneto-optical properties

S. M. J. Beer, M. Arbersha, P. Lindner, M. Winter, D. Rogalla, M. Nolan, A. Ney, J. Debus, A. Devi
Chem. Mater., 2022, 34, 1, 152–164.

Co(II) Amide, Pyrrolate, and Aminopyridinate Complexes: Assessment of their Manifold Structural Chemistry and Thermal Properties

D. Zanders, N. Boysen, M. A. Land, J. Obenlüneschloß, J. D. Masuda, B. Mallick, S. T. Barry, A. Devi
Eur. J. Inorg. Chem., 2021, Accepted Manuscript

CVD grown GaSb_xN_1-x films as visible-light active photoanodes

D. Zywitzki, D. Mitoraj, Y. Vilk, O. Mendoza Reyes, M. Schleuning, D. Friedrich, A. Sadlo, D. Rogalla, R. Eichberger, R. Beranek, A. Devi
Dalton Trans., 2021, 50, 14832-14841

Chemical vapor deposition of Cobalt and Nickel Ferrite thin films: Investigation of structure and pseudocapacitive properties

D. Zywitzki, R. Schaper, E. Ciftyürek, J.-L. Wree, D. H. Taffa, D. M. Baier, D. Rogalla, Y. Li, M. Meischein, A. Ludwig, Z. Li, K. Schierbaum, M. Wark, A. Devi
Adv. Mater. Interfaces, 2021, 8, 2100949

A study on the influence of ligand variation on formamidinate complexes of yttrium: New precursors for atomic layer deposition of yttrium oxide

S. M. J. Beer, N. Boysen, A. Muriqi, D. Zanders, T. Berning, D. Rogalla, C. Bock, M. Nolan, A. Devi
Dalton Trans., 2021, 50, 12944 – 12956

Sensing and electrocatalytic activity of tungsten disulphide thin films fabricated via metalorganic chemical vapour deposition

J.‑L. Wree, J.‑P. Glauber, D. Öhl, A. Niesen, A. Kostka, D. Rogalla, W. Schuhmann, A. Devi
J. Mater. Chem. C, 2021, 9, 10254 – 10265

Atomic Layer Deposition of High-Quality Copper Metal Films from Cu(acac)₂ and Hydroquinone Reductant

T. S. Tripathi, M. Wilken, C. Hoppe, T. de los Arcos, G. Grundmeier, A. Devi, M. Karppinen
Adv. Eng. Mater., 2021, 23, 2100446

Cobalt Metal ALD: Understanding the Mechanism and Role of Zinc Alkyl Precursors as Reductants for Low Resistivity Co Thin Films

D. Zanders, J. Liu, J. Obenlüneschloß, C. Bock, D. Rogalla, L. Mai, M. Nolan, S. T. Barry, A.Devi
Chem. Mater, 2021, 33, 13, 5045-5057

Direct liquid injection chemical vapor deposition of ZrO₂ films from a heteroleptic Zr precursor: Interplay between film characteristics and corrosion protection of stainless steel

S. M. J. Beer, D. Samelor, A. Abdel Aal, J. Etzkorn, D. Rogalla, A. E. Turgambaeva, J. Esvan, A. Kostka, C. Vahlas, A. Devi
J. Mater. Res. Technol., 2021, 13, 1599-1614.

Investigation of an atomic-layer-deposited Al₂O₃ diffusion barrier between Pt and Si for the use in atomic scale atom probe tomography studies on a combinatorial processing platform

Y. Li, D. Zanders, M. Meischein, A. Devi, A. Ludwig
Surf. Interface Anal., 2021, 1-7

(^tBuN)SiMe₂NMe₂ – A new N,N’-Κ₂-monoanionic ligand for atomic layer deposition precursors

M. B. E. Griffiths, D. Zanders, M. A. Land, J. D. Masuda, A. Devi, S. T. Barry
J. Vac. Sci. Technol., A, 2021, 39, 032409.

Atomic layer deposition of dielectric Y₂O₃ thin films from a homoleptic yttrium formamidinate precursor and water

N. Boysen, D. Zanders, T. Berning, S. M. J. Beer, D. Rogalla, C. Bock, A. Devi, RSC Adv., 2021, 11, 2565-2574.

Fabrication of Gd_xFe_yO_z films using an atomic layer deposition-type approach

P. Yu, S. M. J. Beer, A. Devi, M. Coll,
CrystEngComm., 2021,23, 730-740.

A carbene stabilized precursor for the spatial atomic layer deposition of copper thin films

N. Boysen, B. Misimi, A. Muriqi, J.-L. Wree, T. Hasselmann, D. Rogalla. T. Haeger, D. Theirich, M. T. Riedl, A. Devi
Chem. Commun., 2020, 56, 13752-13755.

Development of Guanidinate and Amidinate based Cerium and Ytterbium Complexes as Atomic Layer Deposition Precursors: Synthesis, Modelling, and Application

P. Kaur, L. Mai, A. Muriqi, D. Zanders, R. Ghiyasi, M. Safdar, N. Boysen, M. Winter, M. Nolan, M. Karppinen, A. Devi,
Chem. Eur. J., 2021, 27

A new metalorganic chemical vapor deposition process for MoS₂ with a 1,4-diazabutadienyl stabilized molybdenum precursor and elemental sulfur

J.-L. Wree, E. Ciftyurek, D. Zanders, N. Boysen, A. Kostka, D. Rogalla, M. Kasischke, A. Ostendorf, K. Schierbaum, A. Devi
Dalton Trans., 2020, 49, 13462-13474.

Study on structural and thermal characteristics of heteroleptic yttrium complexes as potential precursors for vapor phase deposition

S. M. J. Beer, A. Krusenbaum, M. Winter, C. Vahlas, A. Devi,
Eur. J. Inorg. Chem., 2020, 3587–3596.

Tuning Coordination Geometry of Nickel Ketoiminates and its Influence on Thermal Characteristics for Chemical Vapor Deposition of Nanostructured NiO Electrocatalysts

D. Zywitzki, D. Taffa, L. Lamkowski, M. Winter, D. Rogalla, M. Wark, A. Devi,
Inorg. Chem., 2020, 59, , 14, 10059–10070.

Additive-free spin coating of tin oxide thin films: Synthesis, characterization and evaluation of tin β-ketoiminates as a new precursor class for solution deposition processes

N. Huster, D. Zanders, S. Karle, D. Rogalla, A. Devi,
Dalton Trans., 2020, 49, 10755-10764.

A Rare Low‐Spin Co(IV) Bis(β‐silyldiamide) with High Thermal Stability: Steric Enforcement of a Doublet Configuration

D. Zanders, G. Bačić, D. Leckie, D. O. Odegbesan, J. Rawson, J. D. Masuda, A. Devi, S. T. Barry,
Angew. Chem., Int. Ed., 2020, 59, 33, 14138-14142.

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From Precursor Chemistry to Gas Sensors: Plasma-Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications

L. Mai, F. Mitschker, C. Bock, A. Niesen, E. Ciftyurek, D. Rogalla, J. Mickler, M. Erig, Z. Li, P. Awakowicz, K. Schierbaum, A. Devi,
Small, 2020, 1907506, 1-12.

Comparative Study of Photocarrier Dynamics in CVD-deposited CuWO₄, CuO, and WO₃ Thin Films for Photoelectrocatalysis

J. Hirst, S. Müller, D. Peeters, A. Sadlo, L. Mai, O. Mendoza Reyes, D. Friedrich, D. Mitoraj, A. Devi, R. Beranek, R. Eichberger, Z. Phys. Chem., 2020, 234(4), 699–717.

PEALD of HfO₂ Thin Films: Precursor Tuning and a New Near Ambient Pressure XPS Approach to in-situ Examination of Thin Film Surfaces Exposed to Reactive Gases

D. Zanders, E. Ciftyurek, E. Subaşı, N. Huster, C. Bock, A. Kostka, D. Rogalla, K. Schierbaum and A. Devi
ACS Appl. Mater. Interfaces, 2019, 11, 31, 28407-28422.

Up-converting ALD/MLD thin films with Yb³⁺, Er³⁺ in amorphous organic framework

M. Tuomisto, Z. Giedraityte, L. Mai, A. Devi, V. Boiko, K. Grzeszkiewicz, D. Hreniak, M. Karppinen, M. Lastusaari
J. Lumin., 2019, 215, 310-315

How Water Flips at Charged Titanium Dioxide: An SFG-Study on the Water-TiO₂-Interface

S. J. Schlegel, S. Hosseinpour, M. Gebhard, A. Devi, M. Bonn, E. H.G. Backus,
Phys. Chem. Chem. Phys., 2019, 21, 8956-8964

Potential Precursor Alternatives to the Pyrophoric Trimethyl Aluminum for the Atomic Layer Deposition of Aluminum Oxide

L. Mai, N. Boysen, D. Zanders, T. de los Arcos, F. Mitschker, B. Mallick, G.Grundmeier, P. Awakowicz, A. Devi
Chem. – Eur. J., 2019, 25, 7489 –7500

Low-Temperature Plasma-Enhanced Atomic Layer Deposition of Tin(IV) Oxide from a Functionalized Alkyl Precursor: Fabrication and Evaluation of SnO₂-Based Thin-Film Transistor Devices

L. Mai, D. Zanders, E. Subaşı, E. Ciftyurek, C. Hoppe, D. Rogalla, W. Gilbert, T. de los Arcos, K. Schierbaum, G. Grundmeier, C. Bock, A. Devi,
ACS Appl. Mater. Interfaces, 2019, 11, 3, 3169-3180

Luminescent Nd₂S₃ thin films: A new chemical vapour deposition route towards rare-earth sulphides

S. Cwik, S. M. J. Beer, M. Schmidt, N. C. Gerhardt, T. de los Arcos, D. Rogalla, J. Weßling, I. Giner, M. R. Hofmann, G. Grundmeier, A. D. Wieck, A. Devi
Dalton Trans., 2019, 48, 2926 – 2938

Electrical Performance and Stability of ZnO Thin-Film Transistors Incorporating Gadolinium Oxide High-k Dielectrics

D. K. Ngwashi, S. Paul, A. Devi, R. B. M. Cross,

Advances in Materials, 2018, 7(4), 137-143

Atomic Layer Deposition of Molybdenum and Tungsten Oxide Thin Films Using Heteroleptic Imido-Amidinato precursors: Process Development, Film Characterization, and Gas Sensing Properties

M. Mattinen, J.-L. Wree, N. Stegmann, E. Ciftyurek, M. E. Achhab, P. J. King, K. Mizohata, J. Räisänen, K. D. Schierbaum, A. Devi, M. Ritala, M. Leskelä
Chem. Mater., 2018, 30, 23 , 8690-8701

Validation of a terminally amino functionalized tetra alkyl Sn(IV) precursor in metalorganic chemical vapor deposition of SnO₂ thin films: Study of film growth characteristics, optical and electrical properties

D. Zanders, E. Ciftyurek, C. Hoppe, A. Kostka, D. Rogalla, T. de los Arcos, G. Grundmeier, K. D. Schierbaum, A. Devi
Adv. Mater. Interfaces, 2019, 6, 1801540

Atomic/molecular layer deposition of Cu–organic thin films

D. J. Hagen, L. Mai, A. Devi, J. Sainioc, M. Karppinen
Dalton Trans., 2018, 47, 15791-15800

An N‐Heterocyclic Carbene Based Silver Precursor for Plasma‐Enhanced Spatial Atomic Layer Deposition of Silver Thin Films at Atmospheric Pressure

N. Boysen, T. Hasselmann, S. Karle, D. Rogalla, D. Theirich, M. Winter, T. Riedl, A. Devi
Angew. Chem. Int. Ed., 2018, 57, 16224–16227

Synthesis of rare-earth metal and rare-earth metal-fluoride nanoparticles in ionic liquids and propylene carbonate

M. Siebels, L. Mai, L. Schmoltke, K. Schütte, J. Barthel, J. Yue, J. Thomas, B. M. Smarsly, A. Devi, R. A. Fischer, C. Janiak
Beilstein J. Nanotechnol. 2018, 9, 1881-1894

Designing Stability into Thermally Reactive Plumbylenes

Bačić, G., Zanders, D., Mallick, B., Devi, A., Barry, S. T.
Inorg. Chem. 2018, 57, 8218−8226

Direct growth of MoS₂ and WS₂ layers by Metal Organic Chemical Vapor Deposition

S. Cwik, D. Mitoraj, D. Rogalla, D. Peeters, J. Kim, O. Mendoza Reyes, H. M. Schütz, C. Bock, R. Beranek, A. Devi,
Adv. Mater. Interfaces 2018, 5, 1800140

Fabrication of Zinc-Dicarboxylate- and Zinc-Pyrazolate-Carboxylate-Framework Thin Films through Vapour-Solid Deposition

R. Medishetty, Z. Zhang, A. Sadlo, S. Cwik, D. Peeters, S. Henke, N. Mangayarkarasi, A. Devi
Dalton Trans. 2018, 47, 14179-14183

Rational development of cobalt β-ketoiminate complexes: Alternative precursors for vapor phase deposition of spinel cobalt oxide photoelectrodes

K. j. Puring, D. Zywitzki, D. H. Taffa, D. Rogalla, M. Winter, M. Wark, A. Devi,
Inorg. Chem. 2018, 57(9), 5133–5144

Ultrasound-mediated deposition and cytocompatibility of apatite-like coatings on magnesium alloys

C.-N. Lui, F. Böke, M. Gebhard, A. Devi, H. Fischer, A. Keller, G. Grundmeier,
Surf. Coat. Technol. 2018, 345, 167-176

PEALD of SiO₂ and Al₂O₃ thin films on polypropylene: Investigations of the film growth at the interface, stress and gas barrier properties of dyads

M. Gebhard, L. Mai, L. Banko, F. Mitschker, C. Hoppe, M. Jaritz, D. Kirchheim, C. Zekorn, T. de Los Arcos, D. Grochla, R. Dahlmann, G. Grundmeier, P. Awakowicz, A. Ludwig, A. Devi,
ACS Appl. Mater. Interfaces 2018, 10, 7422-7434

CVD-grown copper tungstate thin films for solar water splitting

D. Peeters, O. Mendoza Reyes, L. Mai, A. Sadlo, S. Cwik, D. Rogalla, H. Schütz, H.-W. Becker, J. Hirst, S. Müller, D. Friedrich, D. Mitoraj, M. Nagli, M. Caspary Toroker, R. Eichberger, R. Beranek, A. Devi,
J. Mater. Chem. A 2018, 6, 10206 – 10216

Investigating Zinc Ketoiminates as a New Class of Precursors for Solution Deposition of ZnO Thin Films

A. Sadlo, D. Peeters, R. Albert, D. Rogalla, H.-W. Becker, R. Schmechel, A. Devi,
J. Nanosci. Nanotechnol. 2019, 19, 867-876, DOI: 10.1166/jnn.2018.15739

Tailored β-ketoiminato complexes of iron: Synthesis, characterisation and evaluation towards solution based deposition of iron oxide thin films

A. Sadlo, S. M. J. Beer, S. Rahman, M. Grafen, D. Rogalla, M. Winter, A. Ostendorf, A. Devi,
Eur. J. Inorg. Chem. 2018, 1824-1833,

A Combinatorial Approach to Enhance Barrier Properties of Thin Films on Polymers: Seeding and Capping of PECVD Thin Films by PEALD

M. Gebhard, F. Mitschker, C. Hoppe, M. Aghaee, D. Rogalla, M. Creatore, G. Grundmeier, P. Awakowicz, a. Devi,
Plasma Processes Polym. 2018, 15, e1700209

Water assisted atomic layer deposition of yttrium oxide using tris(N,N’-diisopropyl-2-dimethylamido-guanidinato) yttrium(III): Process development, film characterization and functional properties

L. Mai, N. Boysen, E. Subaşı, T. de los Arcos, D. Rogalla, G. Grundmeier, C. Bock, H.-L. Lu, A. Devi,
RSC Adv. 2018, 8, 4987-4994

Molecular engineering of Ga-ketoiminates: Synthesis, structure and evaluation as precursors for the additive-free spin-coated deposition of gallium oxide thin films

R. O’Donoghue, S. Rahman, B. Mallick, M. Winter, D. Rogalla, H. -W. Becker, A. Devi,
New. J. Chem. 2018, 42, 3196-3210

Manganese(II) Molecular Sources for Plasma-Assisted CVD of Mn Oxides and Fluorides: From Precursors to Growth Process

D. Barreca, G. Carraro, E. Fois, A. Gasparotto, F. Gri, R. Seraglia, M. Wilken, A. Venzo, A. Devi, G. Tabacchi, C. Maccato,
J. Phys. Chem. C 2018, 122, 1367

Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy

M. Wiesing, T. de los Arcos, M. Gebhard, A. Devi, G. Grundmeier,
Phys. Chem. Chem. Phys. 2018, 20, 180-190

Atomic Layer Deposition of Nickel on ZnO Nanowire Arrays for High-Performance Supercapacitors

Q.-H. Ren, Y. Zhang, H.-L. Lu, Y.-P. Wang, W.-J. Liu, X.-M. Ji, A. Devi, A.-Q. Jiang, D. W. Zhang,
ACS Appl. Mater. Interfaces 2018, 10, 468-476