Publications 2023

Ultrafast surface-specific spectroscopy of water at a photoexcited TiO₂ model water-splitting photocatalyst

E. H. G. Backus, S. Hosseinpour, C. Ramanan, S. Sun, S. J. Schlegel, M. Zelenka, X. Jia, M. Gebhard, A. Devi, H. I. Wang, M. Bonn
Angew. Chem. Int. Ed., 2023, e202312123

In pursuit of next generation N-heterocyclic carbene-stabilized copper and silver precursors for metalorganic chemical vapor deposition and atomic layer deposition processes

I. Selvakumar, N. Boysen, M. Bürger, A. Devi
Chemistry, 2023, 5, 2038

Ultrashort pulse laser annealing of amorphous atomic layer deposited MoS₂ films

M. J. M. J. Becher, J. Jagosz, R.-M. Neubieser, J.-L. Wree, A. Devi, M. Michel, C. Bock, E, L. Gurevich, A. Ostendorf
Adv. Eng. Mater., 2023, 25, 2300677

Advances in photo-assisted seawater splitting promoted by green iron oxide-carbon nitride photoelectrocatalysts

M. Benedet, G. A Rizzi, O. I Lebedev, V. Roddatis, C. Sada, J.-L Wree, A. Devi, C. Maccato, A. Gasparotto, D. Barreca
J. Mater. Chem. A, 2023, 11 (40), 21595

PECVD and PEALD on polymer substrates (Part I): Fundamentals and analysis of plasma activation and thin film growth

T. de los Arcos, P. Awakowicz, J. Benedikt, B. Biskup, M. Böke, N. Boysen, R. Buschhaus, R. Dahlmann, A. Devi, T. Gergs, J. Jenderny, A. von Keudell, T. D. Kühne, S. Kusmierz, H. Müller, T. Mussenbrock, J. Trieschmann, D. Zanders, F. Zysk, G. Grundmeier
Plasma Process Polym., 2023, e 2300150

PECVD and PEALD on polymer substrates (Part II): Understanding and tuning of barrier and membrane properties of thin films

T. de los Arcos, P. Awakowicz, M. Böke, N. Boysen, R. P. Brinkmann, R. Dahlmann, A. Devi, D. Eremin, J. Franke, T. Gergs, J. Jenderny, E. Kemaneci, T. D. Kühne, S. Kusmierz, T. Mussenbrock, J. Rubner, J. Trieschmann, M. Wessling, X. Xie, D. Zanders, F. Zysk, G. Grundmeier
Plasma Process Polym., 2023, e 2300186

Fe₂O₃-graphitic carbon nitride nanocomposites analyzed by XPS

M. Benedet, D. Barreca, G. A. Rizzi, C. Maccato, J-L. Wree, A. Devi, A. Gasparotto
Surf. Sci. Spectra, 2023, 30, 024021

Complementary spectroscopic and electrochemical analysis of the sealing of micropores in hexamethyldisilazane plasma polymer films by Al₂O₃ atomic layer deposition

X. Xie, D. Zanders, F. Preischel, T. de los Arcos, A. Devi, and G. Grundmeier
Surf. Interface Anal., 2023, 55, 886

Interplay of Precursor and Plasma for The Deposition of HfO₂ via PEALD: Film Growth and Dielectric Properties

Preischel, F.; Zanders, D.; Berning, T.; Kostka, A.; Rogalla, D.; Bock, C.; Devi, A.
Adv. Mater. Interfaces, 2023, 2300244

The impact of plasma enhancement on the deposition of carbon containing zirconia films by metalorganic chemical vapor deposition

Maaß, P. A.; Bedarev, V.; Chauvet, L.; Prenzel, M.; Glauber, J.-P.; Devi, A.; Böke, M.; von Keudell, A.
Plasma Processes Polym., 2023, e2300050

Inorganic Materials Chemistry