Publications 2017

Publications 2017

• Low temperature growth of gallium oxide thin films via plasma enhanced atomic layer deposition
  R. O’Donoghue, J. Rechmann, M. Aghaee, D. Rogalla, H.-W. Becker, M. Creatore, A. D. Wieck and A. Devi,
  Dalton Trans. 2017, 46, 16551-16561

• Molecular Engineering of Mn^II Diamine Diketonate Precursors for the Vapor Deposition of Manganese Oxide Nanostructures
  C. Maccato, L. Bigiani, G. Carraro, A. Gasparotto, R. Seraglia, J. Kim, A. Devi, G. Tabacchi, E. Fois, G. Pace, V. Di Noto and D. Barreca,
  Chem. Eur. J. 2017, 23, 17954-17963

• Integrating AlN with GdN Thin Films in an in Situ CVD Process: Influence on the Oxidation and Crystallinity of GdN
  S. Cwik, S. M. J. Beer, S. Hoffmann, M. Krasnopolski, D. Rogalla, H.-W. Becker, D. Peeters, A. Ney and A. Devi,
  ACS Appl. Mater. Interfaces 2017, 9 (32), 27036–27044

• Temperature Dependent Transport Mechanisms through PE-CVD Coatings: Comparison of Oxygen and Water Vapour
  D. Kirchheim, S. Wilski, M. Jaritz, F. Mitschker, M. Gebhard, M. Brochhagen, C. Hopmann, M. Böke, J. Benedikt, A. Devi, P. Awakowicz and R. Dahlmann,
  J. Phys. D: Appl. Phys. 2017, 50, 395302

• Low-Temperature Atomic Layer Deposition of Low-Resistivity Copper Thin Films Using Cu(dmap)₂ and Tertiary Butyl Hydrazine
  K. Väyrynen, K. Mizohata, J. Räisänen, D. Peeters, A. Devi, M. Ritala†, and M. Leskelä,
  Chem. Mater. 2017, 29 (15), 6502–6510

• Unearthing [3-(dimethylamino)propyl] aluminium(III) complexes as novel ALD precursors for Al₂O₃: Synthesis, characterization and ALD process development
  L. Mai, M. Gebhard, T. de los Arcos, I. Giner, F. Mischker, M. Winter, H. Parala, P. Awakowicz, G. Grundmeier, A. Devi,
  Chem. – Eur. J. 2017, 45, 10768–10772

• Low temperature atomic layer deposition of cobalt oxide as an effective catalyst for photoelectrochemical water splitting devices
  J. Kim, T. Iivonen, J. Hämäläinen, M. Kemell, K. Meinander, K. Mizohata, L. Wang, J. Räisänen, R. Beranek, M. Leskelä, A. Devi,
  Chem. Mater. 2017, 29 (14), 5796–5805

• New amidinate complexes of indium(III): Promising CVD precursors for transparent and conductive In₂O₃ thin films
  M. Gebhard, M. Hellwig, A. Kroll, D. Rogalla, M. Winter, B. Mallick, A. Ludwig, M. Wiesing, A. Wieck, G. Grundmeier, A. Devi,
  Dalton Trans. 2017, 46, 10220-10231

• Photoactive zinc ferrites fabricated via conventional CVD approach
  D. Peeters, D. H. Taffa, M. M. Kerrigan, A. Ney, N. Jöns, D. Rogalla, S. Cwik, H.-W. Becker, M. Grafen, A. Ostendorf, C. H. Winter, S. Chakraborty, M. Wark, A. Devi,
  ACS Sustainable Chem. Eng. 2017, 5, 2917-2926

• Nanostructured Fe₂O₃ Processing via Water-Assisted ALD and Low-Temperature CVD from a Versatile Iron Ketoiminate Precursor
  D. Peeters, A. Sadlo, K. Lowjaga, O. Mendoza Reyes, L. Wang, L. Mai, M. Gebhard, D. Rogalla, H.-W. Becker, I. Giner, G. Grundmeier, D. Mitoraj, M. Grafen, A. Ostendorf, R. Beranek and A. Devi,
  Adv. Mater. Interfaces 2017, 18, 1700155 (11pp)

• Influence of PE-CVD and PE-ALD on defect formation in permeation barrier films on PET and correlation to atomic oxygen fluence
  F. Mitschker, S. Steves, M. Gebhard, M. Rudolph, L. Schücke, D. Kirchheim, M. Jaritz, M. Brochhagen, C. Hoppe, R. Dahlmann, M. Boeke, J. Benedikt, I. Giner, T. de los Arcos, C. Hopmann, G. Grundmeier, A. Devi and P. Awakowicz,
  J. Phys. D.: Appl. Phys. 2017, 50, 235201 (11pp)

• Transport mechanims through PECVD coatings: influence of temperature, coating properties and defects on permeation of water vapor
  D. Kirchheim, M. Jaritz, F. Mitschker, M. Gebhard, M. Brochhagen, C. Hopmann, M. Böke, A. Devi, P. Awakowicz and R. Dahlmann,
  J. Phys. D: Appl. Phys. 2017, 50(8), 085203

• Atomic/molecular layer deposition of hybrid inorganic-organic thin films from erbium guanidinate precursor
  Lukas Mai, Zivile Giedraityte, Marcel Schmidt, Detlef Rogalla, Sven Scholz, Andreas D. Wieck, Anjana Devi and Maarit Karppinen,
  J. Mater. Sci. 2017, 11, 6216–6224

• Synthesis and evaluation of new copper ketoiminate precursors for a facile and additive-free solution-based approach to nanoscale copper oxide thin films
  S. Karle, D. Rogalla, A. Ludwig, H. –W. Becker, A. Wieck, M. Grafen, A. Ostendorf and A. Devi,
  Dalton Trans. 2017, 46, 2670-2679