Publications 2016

An efficient PE-ALD process for TiO₂ thin films employing a new Ti-precursor
M. Gebhard, F. Mitschker, M. Wiesing, I. Giner, B. Torun, T. de los Arcos, P. Awakowicz, G. Grundmeier and A. Devi,
J. Mater. Chem. C 2016, 4, 1057

Systematic molecular engineering of Zn-ketoiminates for application as precursors in atomic layer deposition of zinc oxide
R. O’ Donoghue, D. Peeters, D. Rogalla, H. -W. Becker, J. Rechmann, S. Henke, M. Winter and A. Devi,
Dalton Trans. 2016, 45 (47), 19012

Review Article: Recommended reading list of early publications on atomic layer deposition – Outcome of the “Virtual Project on the History of ALD
Esko Ahvenniemi Andrew R. Akbashev Saima Ali Mikhael Bechelany Maria Berdova Stefan Boyadjiev David C. Cameron Rong Chen Mikhail Chubarov Veronique Cremers Anjana Devi Viktor Drozd Liliya Elnikova Gloria Gottardi Kestutis Grigoras Dennis M. Hausmann Cheol Seong Hwang Shih-Hui Jen Tanja Kallio Jaana Kanervo Ivan Khmelnitskiy Do Han Kim Lev Klibanov Yury Koshtyal A. Outi I. Krause Jakob Kuhs Irina Kärkkänen Marja-Leena Kääriäinen Tommi Kääriäinen Luca Lamagna Adam A. Łapicki Markku Leskelä Harri Lipsanen Jussi Lyytinen Anatoly Malkov and Anatoly Malygin Abdelkader Mennad Christian Militzer Jyrki Molarius Małgorzata Norek Çağla Özgit-Akgün Mikhail Panov Henrik Pedersen Fabien Piallat Georgi Popov Riikka L. Puurunen Geert Rampelberg Robin H. A. Ras Erwan Rauwel Fred Roozeboom Timo Sajavaara Hossein Salami Hele Savin Nathanaelle Schneider Thomas E. Seidel Jonas Sundqvist Dmitry B. Suyatin Tobias Törndahl J. Ruud van Ommen Claudia Wiemer Oili M. E. Ylivaara Oksana Yurkevich,
J. Vac. Sci. Technol. 2016, 35(1), 010801/1-010801/13.