Publications 2014

Publications 2014

• Indium-tris-guanidinates: a promising class of precursors for water assisted atomic layer deposition of In₂O₃ thin films
  M. Gebhard, M. Hellwig, H. Parala, K. Xu, M. Winter, A. Devi,
  Dalton Trans. 2014, 43(3), 937

• Investigations on the structural, compositional and functional properties of MOCVD grown Er₂O₃ thin films
  K. Xu, V. S. Dang, A. Ney, T. de los Arcos, A. Devi,
  J. Nanosci. Nanotechnol. 2014, 14(7), 5095

• MOCVD of tungsten nitride thin films: Comparison of precursor performance and film characteristics
  N. B. Srinivasan, T. Thiede, T. de los Arcos, D. Rogalla, H.-W. Becker, A. Devi, R. A. Fischer,
  Physica Status Solidi A: Applications and Materials Science 2014, 211(2), 260

• Tailoring iron(III) oxide nanomorphology by chemical vapor deposition: Growth and characterization
  D. Peeters, G. Carraro, C. Maccato, H. Parala, A. Gasparotto, D. Barreca, C. Sada, K. Kartaschew, M. Havenith, D. Rogalla,
  Physica Status Solidi A: Applications and Materials Science 2014, 211(2), 316

• Novel ß-ketoiminato complexes of zirconium: synthesis, characterization and evaluation for soultion based processing of ZrO₂ thin films
  M. Banerjee, R. W: Seidel, M. Winter, H.-W. Becker, D. Rogalla, A. Devi,
  Dalton Trans. 2014, 43(6), 2384

• Electrical and optical properties of TiO₂ thin films prepared by plasma-enhanced atomic layer deposition
  V.S. Dang, H. Parala, J. H. Kim, K. Xu, N. B. Srinivasan, E. Edengeiser, M. Havenith, A. WIeck, T. de los Arcos, R. A. Fischer,
  Physica Status Solidi A: Applications and Materials Science 2014, 211(2), 416

• Surface Decoration of ε-Fe₂O₃ Nanorods by CuO Via a Two-Step CVD/Sputtering Approach
  D. Barreca, G. Carraro, D. Peeters, A. Gasparotto, C. Maccato, W. M. M. Kessels, V. Longo, F. Rossi, E. Bontempi, C. Sada, A. Devi,
  Chem. Vap. Deposition 2014, 20(7-9), 313

• Recent advances using guanidinate ligands for chemical vapour deposition (CVD) and atomic layer deposition (ALD) applications
  A. Kurek, P. Gordon, S. Karle, A. Devi, S. T. Barry,
  Aust. J. Chem 2014, 67(7), 989

• Preface to the CVD Special Issue: Atomic-Scale-Engineered Materials (ASEM)
  A. Devi, W. M. M. Kessels ,
  Chem. Vap. Deposition 2014, 20(7-9), 186

• MOCVD of TiO₂ Thin Films using a Heteroleptic Titanium Complex: Precursor Evaluation and Investigation of Optical, Photoelectrochemical and Electrical Properties
  M. Banerjee, V.-S. Dang, M. Bledowski, R. Beranek, H.-W. Becker, D. Rogalla, E. Edengeiser, M. Havenith, A. D. Wieck, A. Devi,
  Chem. Vap. Deposition 2014, 20(7-9), 224

• Investigation of Optical, Electrical, and Mechanical Properties of MOCVD-grown ZrO₂ Films
  V.-S. Dang, M. Banerjee, H. Zhu, N. B. Srinivasan, H. Parala, J. Pfetzing-Micklich, A. D. Wieck, A. Devi ,
  Chem. Vap. Deposition 2014, 20(7-9), 320

• Atomic-scale engineering of multifunctional nano-sized materials and films
  F. Roozeboom, D. Barreca, A. Devi, H. Parala, M. Ritala ,
  Phys. Status Solidi A 2014, 211(2), 249

• Atomic Layer Deposition of TiO₂ and ZrO₂ Thin Films Using Heteroleptic Guanidinate Precursors
  M. Kaipio, T. Blanquart, M. Banerjee, K. Xu, J. Niinistoe, V. Longo, K. Mizohata, A. Devi, M. Ritala, M. Leskelae,
  Chem. Vap. Deposition 2014, 20(7-9), 209