Publications 2013

Publications 2013

• Transition metal nitride thin films grown by MOCVD using amidinato based complexes [M(NtBu)₂{(ⁱPrN)₂CMe}₂] (M = Mo, W) as precursors
  N. B. Srinivasan, T. Thiede, T. de los Arcos, V. Gwildies, M. Krasnopolski, H.-W. Becker, D. Rogalla, A. Devi, R. A. Fischer,
  Surf. Coat. Technol. 2013, 230, 130

• Intrinsic Nitrogen-doped CVD-grown TiO₂ Thin Films from All-N-coordinated Ti Precursors for Photoelectrochemical Applications
  S. Kim, K. Xu, H. Parala, R. Beranek, M. Bledowski, K. Sliozberg, H.-W. Becker, D. Rogalla, D. Barreca, C. Maccato, C. Sade, W. Schuhmann, R. A. Fischer, A. Devi ,
  Chem. Vap. Deposition 2013, 19(1-3), 45

• Homoleptic Gadolinium Amidinates as Precursors for MOCVD of Oriented Gadolinium Nitride (GdN) Thin Films
  M. Krasnopolski, C. G. Hrib, R. W. Seidel, M. Winter, H.-W. Becker, D. Rogalla, R. A. Fischer, F. T. Edelmann, A. Devi ,
  Inorg. Chem. 2013, 52(1), 286

• Growth and Crystallization of TiO₂ Thin Films by Atomic Layer Deposition Using a Novel Amido Guanidinate Titanium Source and Tetrakis-dimethylamido-titanium
  M. Reiners, K. Xu, N. Aslam, A. Devi, R. Waser, S. Hoffmann-Eifert,
  Chem. Mater. 2013, 25(15), 2934

• Atomic layer deposition of Er₂O₃ thin films from Er tris-guanidinate and water: process optimization, film analysis and electrical properties
  K. Xu, A. R. Chaudhuri, H. Parala, D. Schwendt, T. de los Arcos, H.-J. Osten, A. Devi,
  J. Mater. Chem. C 2013, 1(25), 3939

• A Z’ = 6 crystal structure of (E)-N,N’-dicyclohexylacetamidine
  M. Krasnopolski, R. W. Seidel, R. Goddard, J. Breidung, M. Winter, A. Devi, R. A. Fischer,
  J. Mol. Struct. 2013, 1031, 239

• [Zr(NEtMe)₂(guan-NEtMe)₂] as a Novel Atomic Layer Deposition Precursor: ZrO₂ Film Growth and Mechanistic Studies
  T. Blanquart, J. Niinisto, N. Aslam, M. Banerjee, Y. Tomczak, M. Gavagnin, V. Longo, E. Puukilainen, H. D. Wanzenboeck, W. M. M. Kessels, A. Devi, S. Hoffmann-Eifert, M. Ritala, M. Leskelae,
  Chem. Mater. 2013, 25(15), 3088

• ‘Old Chemistries’ for new applications: Perspectives for development of precursors for MOCVD and ALD applications
  A. Devi,
  Coord. Chem. Rev. 2013, 257(23-24), 3332