Publications 2010

Publications 2010

• Growth of crystalline Gd₂O₃ thin films with high quality interface on Si(100) by low temperature H₂O assisted atomic layer deposition
  A. P. Milanov, K. Xu, A. Laha, E. Bugiel, R. Ranjith, D. Schwendt, H. J. Osten, H. Parala, R. A. Fischer, A. Devi,
  J. Am. Chem. Soc. 2010, 132, 36

• ZnO Nanorod Arrays by Plasma-Enhanced CVD for Light-Activated Functional Applications
  D. Bekermann, A. Gasparotto, D. Barreca, A. Devi, R. A. Fischer, M. Kete, U. Lavrencic Stangar, O. I. Lebedev, C. Maccato, E. Tondello, G. Van Tendeloo,
  ChemPhysChem 2010, 11(11), 2337

• All-Nitrogen Coordinated Amidinato Imido Complexes of Molybdenum and Tungsten: Syntheses and Characterization
  V. Gwildies, T. B. Thiede, S. Amirjalayer, L. Alsamman, A. Devi, R. A. Fischer,
  Inorg. Chem. 2010, 49(18), 8487

• Deposition of SrRuO₃ thin films on oxide substrates with liquid-delivery spin MOCVD
  J. Schwarzkopf, R. Dirsyte, A. Devi, M. Schmidbauer, G. Wagner, R. Fornari,
  Thin Solid Films 2010, 518, 4675

• 1D ZnO nano-assemblies by Plasma-CVD as chemical sensors for flammable and toxic gases
  D. Barreca , D. Bekermann , E. Cominic , A. Devi, R. A. Fischer, A. Gasparotto, C. Maccato, G. Sberveglieric, E. Tondello,
  Sens. & Actuators (B): Chemical 2010, B149(1), 1

• Down scaling of defect passivated Gd₂O₃ thin films on p-Si(001) wafers grown by H₂O assisted atomic layer deposition
  R. Ranjith, A. Laha, E. Bugiel, H. J. Osten, K. Xu, A. P. Milanov, A. Devi,
  Semicond. Sci. Technol. 2010, 25, 105001

• Growth and Characterization of Ti-Ta-O Thin Films on Si Substrates by Liquid Injection MOCVD for High-k Applications from Modified Titanium and Tantalum Precursors
  A. Devi, M. Hellwig, D. Barreca, H. Parala, R. Thomas, H.-W. Becker, Ram. S. Katiyar, R. A. Fischer, E. Tondello,
  Chem. Vap. Deposition 2010, 16, 157

• Highly Oriented ZnO Nanorod Arrays by a Novel Plasma Chemical Vapor Deposition Process
  D. Bekermann, A. Gasparotto, D. Barreca, L. Bovo, A. Devi, R. A. Fischer, O. I. Lebedev, C. Maccato, E. Tondello, G. Van Tendeloo,
  Cryst. Growth & Design 2010, 10, 2012

• Volatile, Monomeric and Fluorine-free Precursors for the Metal Organic Chemical Vapor Deposition of Zinc Oxide
  D. Bekermann, D. Rogalla, H.-W. Becker, M. Winter, R. A. Fischer, A. Devi,
  Eur. J. Inorg. Chem. 2010, 9, 1366

• Urchin-like ZnO nanorod arrays for gas sensing applications
  D. Barreca, D. Bekermann, E. Comini, A. Devi, R. A. Fischer, A. Gasparotto, C. Maccato, C. Sada, G. Sberveglieri, E. Tondello,
  CrystEngComm 2010 12, 3419

• Heteroleptic guanidinate and amidinate based complexes of hafnium as new precursors for MOCVD of HfO₂
  K. Xu, A. P. Milanov, M. Winter, D. Barreca, A. Gasparotto, H.-W. Becker, A. Devi,
  Eur. J. Inorg. Chem. 2010, 11, 1679

• Liquid injection MOCVD grown binary and ternary rare-earth oxides as alternative gate oxides for logic devices
  R. Thomas, P. Ehrhart, R. Waser, J. Schubert, A. Devi, R. S. Katiyar,
  ECS Trans. 2010, 33(3), 211

• Engineered Tungsten Oxy-Nitride Thin Film Materials for Photocatalytical Water Splitting Fabricated by MOCVD
  S. Cwik, . A. P. Milanov, V. Gwildies, T. B. Thiede, V. S. Vidyarthi, A. Savan, R. Meyer, H.-W. Becker, D. Rogalla, A. Ludwig, R. A. Fischer, A. Devi,
  ECS Trans. 2010, 28(8), 159