New Publication
We have identified and explored new Au and Cu precursors for ALD and MOCVD of coinage metal films. Ilam, Nils and Marco teamed up to come up with some exciting molecules which show promising properties for thin film deposition.Next generation N-heterocyclic carbene-stabilized copper and silver precursors for metalorganic chemical vapor deposition and atomic Layer deposition processes, Chemistry, 2023, 5, 2038.