Two new publications in Dalton Transactions
Two back-to-back publications in Dalton Transactions are accepted and we are very happy with this excellent and productive collaboration with Aalto University.1. Growth of metalcone thin films using non-pyrophoric precursors. A new perspective for developing alternative precursors.
Low-temperature ALD/MLD growth of alucone and zincone thin films from non-pyrophoric precursors
Anish Philip, Lukas Mai, Ramin Ghiyasi, Anjana Devi, and Maarit Karppinen
2. New ALD processing of tin oxide films with phase control
Our goal is to develop a low temperature water based ALD process for tin oxide employing precursors that show promising physico-chemical properties for ALD growth. The work was jointly carried out at RUB and Aalto University.
SnO via Water Based ALD Employing Tin(II) Formamidinate: Precursor Characterization and Process Development
Niklas Huster, Ramin Ghiyasi, David Zanders, Detlef Rogalla, Maarit Karppinen and Anjana Devi